2002 45th Technical Conference Proceedings

Note: Number in brackets on the top line is the paper number for 2002.

Plenary Session

Patents in the 21st Century [1]
R.A. Killworth, Killworth, Gottman, Hagan & Schaeff L.L.P., Dayton, Ohio.....3

Multi-Level Control for Reactive Sputtering [2]
W.D. Sproul and B.E. Sylvia, Reactive Sputtering, Inc., Goleta, CA.....11

Simulation of Reactive Magnetron Sputtering Kinetics in Real In-Line Processing Chambers [3]
A. Pflug, N. Malkomes, V. Sittinger, and B. Szyszka, Fraunhofer Institute for Thin Films and Surface
Engineering (IST), Braunschweig, Germany.....16

Controlled Reactive Sputter Deposition in DC Mode: an Alternative for Switching [4]
A. Blondeel, Bekaert VDS, Belgium; and W. De Bosscher, Sinvaco, Belgium.....22

Reactively Sputtering High on the Transition Curve Using a Few Inexpensive Components [5]
J. German, Sage Electrochromics, Faribault, MN; and D. Pelleymounter, Advanced Energy, Northfield, MN.....27

Arc Discharges in the Reactive Sputtering of Electrical Insulating Compounds [6]
A. Segers, Bekaert N.V., Zwevegem, Belgium; and D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, State University of Ghent, Ghent, Belgium.....30

Temperature Control of Glass Substrates in an Ion-Beam-Assisted Sputtering Deposition System [7]
D. Deakins, I. Kameyama, B. Buchholtz, and R. Blacker, Veeco-Ion Tech, Inc., Fort Collins, CO.....36

Comparison of Different Concepts for the Stabilization of Reactive Sputtering Processes [8]
N. Malkomes, A. Pflug, B. Szyszka, and M. Vergöhl, Fraunhofer Institute for Thin Films and Surface Engineering (IST), Braunschweig, Germany.....41

Advanced Application Tailored PVD Coatings Utilizing Nanoscale Multilayer/Superlattice Structures [9]
P.Eh. Hovsepian, Sheffield Hallam University, Sheffield, UK; and W.-D. Münz, Bodycote SHU Coatings Ltd. and Sheffield Hallam University, Sheffield, UK.....49

Color Measurement for Decorative Coatings on Three-Dimensional Parts [10]
P. Sullivan, Vapor Technologies, Longmont, CO; M. Mann and L. Wilburn, Delta Faucet Company, Chickasha, OK; and G. DeVries, Delta Faucet Company, Greensburg, IN 56

Nanolayered Hard Coatings for High-Temperature Applications [11]
S.A. Barnett and K. Martin, Northwestern University and Functional Coating Technology, Evanston, IL; A. Madan, Northwestern University, Evanston, IL; J. Ji and I. Kim, Functional Coating Technology,Evanston, IL; and A. Inspekton, Kenymetal, Latrobe, PA 59

New Ultrasonic Technology Improves Cleaning and Prevents Surface Damage Due to Cavitation Erosion Effects [12]
F.J. Fuchs, Blackstone-Ney Ultrasonics, Jamestown, NY.....64

Pre PVD Cleaning [13]
K. Brondum, E. Sprague, J. Hutchinson, and G. Pargas, Vapor Technologies Inc., Longmont, CO.....68

Multistage Ultrasonic Cleaning for Industrial PVD Applications [14]
M. Ertl, ECE, Bensheim, Germany; and R. Hohl, UCM, St. Margrethen, Switzerland.....74

Chromium Reduction in Gas Turbine Engines [15]
L.O. Cato, Concurrent Technologies Corporation, Edgefield, SC; and M.L. Klingenberg, Concurrent Technologies Corporation, Johnstown, PA.....78

Emerging Technologies

ElectroSpark Deposition: Principles and Applications [16]
R.N. Johnson, Pacific Northwest National Laboratory, Richland, WA.....87

Silica-Based Oxygen Barrier Coatings onto PET Films via Combustion Chemical Vapor Deposition [17]
G.N. Deshpande, M.B. Jones, and A.T. Hunt, MicroCoating Technologies, Inc., Atlanta, GA.....93

High Deposition Rate Reactive Sputtering with Hollow Cathode [18]
A.A. Pradhan and S.I. Shah, University of Delaware, Newark, DE.....96

Thick Film Substrate Heaters for CVD and PVD Applications [19]
S. Johnson and C. Hagen, Motorola Labs, Tempe, AZ.....101

Advanced Plasma Processing by 2.45 GHz SLAN Microwave and 13.56 MHz Hollow Cathode Plasma Sources [20]
A. Schwabedissen and J. Engemann, Forschungszentrum für Mikrostrukturtechnik – fmt, University of Wuppertal, Wuppertal, Germany.....103

Hollow Cathode Plasma Cleaning and Surface Activation [21]
H. Baránková and L. Bárdos, Uppsala University, Uppsala, Sweden.....109

Reactive Sputtering from a Dual Rotatable Cathode for SiO₂, Si₃N₄ and SiOxNy Coatings onto Flexible Substrates [22]
A.W. Smith, N.G. Butcher, and D. Walker, Valmet General, Heywood, United Kingdom.....113

Li₃PO₄:N/LiCoO₂ Coatings for Thin Film Batteries [23]
M.E. Gross, P.M. Martin, D.C. Stewart, J.W. Johnston, C.F. Windisch, and G.L. Graff, Pacific Northwest National Laboratory, Richland, WA; and P.L. Rissmiller and E.L. Dudeck, Mine Safety Appliances Company, Sparks, MD.....119

Reactive Multilayer Foils: Rapid Heat Sources for Soldering and Brazing Materials [24]
T.P. Weihs and O.M. Knio, Reactive NanoTechnologies, Baltimore, MD paper withdrawn just prior to publication

Large Area Coating

Large Area Ion-Beam Deposition of Hydrogenated Tetrahedral Amorphous Carbon on Soda-Lime Glass [25]
V.S. Veerasamy, R.H. Petrmichl, H.A. Luten, and S.V. Thomsen, Guardian Industries Corporation, Science and Technology Center, Carleton, MI.....127

Uniformity Control in Sputter Deposition Processes [26]
W. De Bosscher, Bekaert Advanced Coatings, Deinze, Belgium; A. Blondeel, Bekaert VDS, Deinze, Belgium;
and G. Buyle, State University of Ghent, Ghent, Belgium.....135

High Rate Deposition from Ceramic Targets of Titania-Based Low-Emissivity Coatings [27]
P. Greene, J. Rietzel, and S. Nadel, Von Ardenne Coating Technology, Fairfield CA.....142

Process Control Requirements for Uniform Large Area Coatings [28]
L. Anderson, T. Rettich, and P. Wiedemuth, Hüttinger Elektronik GmbH + Co. KG, Freiburg, Germany.....148

Process Development for Large Area Reactive Magnetron Sputtering [29]
C. May, F. Milde, and G. Teschner, Von Ardenne Anlagentechnik GmbH, Dresden, Germany.....153

Fast Process Setup Times for Sputtered Dielectric Beam Splitters with TiO₂ and SiO₂ Layers Using Computer-Aided Recalculation [30]
H.G. Lotz, J. Trube, and A. Zmelty, Applied Films GmbH & Co. KG, Alzenau, Germany.....159

Assessment of Attitudes and Expectations of Switchable Glass Among United States Window Manufacturers [31]
G.M. Sottile, Townsend Research Group LLC, Hartland, CT.....163

Plasma Simulation for Planar Sputtering Cathodes [32]
A. Lopp, C. Braatz, M. Geisler, H. Claus, and J. Trube, Applied Films GmbH & Co. KG, Alzenau, Germany.....170

Improving the Adhesion of Siloxane-Based Plasma Coatings on Polymers with Defined Wetting Properties [33]
D. Hegemann, H. Brunner, and C. Oehr, Fraunhofer Institute for Interfacial Engineering and Biotechnology (IGB), Stuttgart, Germany.....174

Investigation of Al-Si Compositions for Thin Film Applications [34]
G.M. Wityak, Academy Precision Materials, Division of Academy Corporation, Albuquerque, NM.....179

Biased Dual Magnetron Sputter Deposition of Alumina [35]
A. Belkind, Abe Belkind & Associates, North Plainfield, NJ; W. Song, Stevens Institute of Technology,
Hoboken, NJ; and G. McDonough and R. Scholl, Advanced Energy Industries, Fort Collins, CO.....184

Large Area Dielectric Coating of Silicon Dioxide on Steel by Reactive EB-PVD [36]
E. Reinhold, H. Hummel, J. Richter, and U. Seyfert, Von Ardenne Anlagentechnik GmbH, Dresden, Germany.....190

Energetic Substrate Bombardment in Reactive Sputtering with Flange-Mounted Magnetrons in Different Pulse Modes [37]
H. Bartzsch, P. Frach, K. Goedicke, and Chr. Gottfried, Fraunhofer-Institut für Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....196

Novel Magnetic Plasma Confinement Method for Plasma Treatment and PECVD Processes [38]
J. Madocks, Applied Process Technologies, Inc., Tucson, AZ.....202

Optical Coating

Advanced Automotive Glazings: a Cool Idea for Hot Cars [39]
R.B. Farrington, National Renewable Energy Laboratory, Golden, CO.....209

Toward the Manufacture of "Perfect" Antireflection Coatings [40]
P. Ma, J.A. Dobrowolski, D. Poitras, T. Cassidy, and F. Lin, Institute of Microstructural Sciences, National Research Council of Canada, Ottawa, Canada.....216

Annealing Effects on the Properties of Optical Filters [41]
S.M. Lee, A. Dummer, and C. Montcalm, Veeco-Ion Tech, Inc., Fort Collins, CO; and S. Kohli, Colorado State University, Fort Collins, CO.....220

Optical and Electrical Impedance Spectroscopy Studies of Protein-Lipid Bilayer Systems on a Thin Film Coupled Plasmon-Waveguide Resonator [42]
Z. Salamon and G. Tollin, University of Arizona, Tucson, AZ; and I. Stevenson and D. Morton, Denton Vacuum, LLC, Moorestown, NJ.....224

Ultra-Low Anti-Reflection (AR) Coating for High-Power External Cavity Diode Lasers (ECLs) [43]
L. Huang, G. Zhang, and W. Tang, New Focus, Inc., San Jose, CA.....228

Design and Characterization of Ion Beam Deposited Gain Flattening Filters [44]
R. Blacker, D. Deakins, I. Kameyama, A. Dummer, B. Buchholtz, D. Siegfried, and C. Montcalm, Veeco-Ion Tech, Inc., Fort Collins, CO.....232

Fabrication and Optical Behavior of Chiral Thin Film Materials [45]
M.J. Brett, M.O. Jensen, J.C. Sit, S.R. Kennedy, and K.D. Harris, University of Alberta, Edmonton, Canada;
and D.J. Broer, Philips Research Laboratories, Eindhoven, The Netherlands.....238

High-Rate Dual Ion Beam Sputtering Deposition Technology for Optical Telecommunication Filters [46]
C. Montcalm, S.M. Lee, D. Burtner, A. Dummer, D. Siegfried, I. Wagner, and M. Watanabe, Veeco Instruments Inc., Fort Collins, CO.....245

In Situ Ellipsometric Study of the Initial Growth Stages of a-TiO₂ by PECVD [47]
A. Amassian*, S. Larouche, J.E. Klemberg-Sapieha, P. Desjardins, and L. Martinu, École Polytechnique, Montréal, Canada.....250

Influences of the Substrate and Deposition Process on the Accuracy of Optical Monitoring [48]
D. Deakins and R. Ferguson, Veeco-Ion Tech, Inc., Fort Collins, CO.....256

The Use of Etching During the Precise Manufacture of Optical Multilayer Coatings [49]
D. Poitras, T. Cassidy, S. Moisa, and J.A. Dobrowolski, Institute for Microstructural Sciences, National
Research Council of Canada, Ottawa, Canada.....262

Characterization of Thin Metal Films of Niobium and Zirconium [50]
F. Placido and A. Voronov, University of Paisley, Paisley, United Kingdom.....266

Optical Thin Film Deposition by Filtered Cathodic Arc Techniques [51]
P.J. Martin and A. Bendavid, CSIRO Telecommunications and Industrial Physics, Lindfield, Australia.....270

Low-Cost High-Performance Transparent Conducting Oxide Films Fabricated by Combustion Chemical Vapor Deposition [52]
Z. Zhao, M. Vinson, J. McEntyre, F. Fortunato, and A.T. Hunt, MicroCoating Technologies, Inc., Atlanta, GA.....274

SiOx – SiNx Functional Coatings by PECVD of Organosilicon Monomers Other Than Silane [53]
F. Benítez* and J. Esteve, Universitat de Barcelona, Barcelona, Spain; and M. Galan, Telstar Industrial, Terrassa, Spain.....280

Effects of Increasing Nitrogen on Amorphous TiOxNy Thin Films [54]
K. Hukari, AFG Development Center, Petaluma, CA; R. Dannenberg, Chahaya Optronics, Fremont, CA;
and E.A. Stach, Lawrence Berkeley National Laboratory, Berkeley, CA.....286

Broad Band Antireflection Coating on Zinc Selenide from 2 to 12 µm Wavelength Region [55]
A. Ghosh, P. Kant, P. Chandra, and P.K. Bandyopadhyay, Instruments Research and Development Establishment, Dehra Dun, India.....292

Application of a Refined Error Model of Turning Point Monitoring to the Simulation of Narrow Bandpass Filter Production [56]
R.R. Willey, Willey Optical, Consultants, Charlevoix-the-Beautiful, MI.....295

Optical Monitoring of Thin Films Using Spectroscopic Ellipsometry [57]
D.E. Morton, Denton Vacuum, LLC, Moorestown, NJ; and B. Johs and J. Hale, J.A. Woollam Co., Inc.,
Lincoln, NE.....299

Substrate Response During Dual Bipolar Pulsed Magnetron Sputtering [58]
J. O’Brien and P.J. Kelly, University of Salford, Salford, United Kingdom; J.W. Bradley, UMIST, Manchester, United Kingdom; R. Hall, Advanced Energy Industries UK Ltd., Bicester, United Kingdom; and R.D. Arnell, University of Salford, Salford, United Kingdom.....306

Plasma Processing

Pulse Magnetron Sputtering—Development and Application Trends [59]
T. Winkler, Fraunhofer Institut Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....315

Study of the Reactivity of Tin and Titanium During the Synthesis of SnOx and TiOx Thin Films by DC Magnetron Reactive Sputtering [60]
R. Snyders*, M. Wautelet, R. Gouttebaron, J.P. Dauchot, and M. Hecq, Mons-Hainaut University, Mons, Belgium.....323

CrN Deposition by Reactive High-Power Density Pulsed Magnetron Sputtering [61]
A.P. Ehiasarian and W.-D. Münz, Sheffield-Hallam University, Sheffield, United Kingdom; and L. Hultman and U. Helmersson, Linköping University, Linköping, Sweden.....328

Optical Emission Studies for the Characterization of Pulsed Magnetron Sputtering Systems [62]
M. Cornett and M. George, Deposition Sciences, Inc., Santa Rosa, CA; B. Fries and H. Walde, Advanced Energy Industries, Fort Collins, CO; and L. Casson and R. Pini, Jobin Yvon, Inc., Edison, NJ.....335

Magnetron Sputtering Deposition of Titanium Nitride Films Using Optical Emission Spectroscopy (OES) as In-Situ Technique for Plasma Diagnostics [63]
C. Goyes, F. Sequeda, and A. Neira*, Universidad del Valle, Santiago de Cali, Colombia.....341

Influence of Recapture of Secondary Electrons on the Magnetron Sputtering Deposition Process [64]
G. Buyle*, D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, State University of Ghent, Ghent, Belgium;
and W. De Bosscher, Bekaert Advanced Coatings (Bekaert VDS), Deinze, Belgium.....348

Plasma Processing System Based on Electron Beam Ionization [65]
D. Leonhardt, M.M. Balkey, R.F. Fernsler, R.A. Meger, and D.P. Murphy, Naval Research Laboratory, Plasma Physics Division, Washington, DC; and S.G. Walton and D.D. Blackwell, SFA, Inc., Largo, MD.....354

Ion Plating and Beyond: Pushing the Limits of Energetic Deposition [66]
A. Anders, Lawrence Berkeley National Laboratory, Berkeley, CA.....360

Modification of Polyolefins in Nitrogen Atmospheric Pressure Glow Discharges: Surface Degradation and Hydrophobic Recovery [67]
S. Guimond* and I. Radu, École Polytechnique, Montréal, Canada; G. Czeremuszkin, Nova-Plasma Inc., Montréal, Canada; and M.R. Wertheimer, École Polytechnique, Montréal, Canada.....366

Parallel Plate rf Plasma Deposition of Si/C Films Using Tetraalkylsilanes as Precursor Compounds [68]
C. Rapiejko*, R. Mazurczyk, and M. Gazicki-Lipman, Technical University of Lodz, Lodz, Poland; and A. Werbowy, Warsaw University of Technology, Warsaw, Poland.....372

Ion Flux Measurements in Electron Beam-Generated Plasmas [69]
S.G. Walton, SFA, Inc., Largo, MD; D. Leonhardt, R.F. Fernsler, and R.A. Meger, Naval Research Laboratory, Washington, DC.....378

Understanding Chemical Decomposition Pathways of Organic Molecules in Low Density Discharges as a Prelude to Plasma Functionalization of Surfaces [70]
D.C. Guerin and V.A. Shamamian, Naval Research Laboratory, Washington, DC.....384

Tribological & Wear Coating

Tribological Testing of PVD Coatings for Mechanical Components [71]
S. Jacobson and S. Hogmark, The Ångström Laboratory, Uppsala University, Uppsala, Sweden.....393

High-Density Pulsed Plasmas for the Deposition of Hard Coatings on Three-Dimensional Substrates [72]
H. Klostermann, F. Fietzke, O. Zywitzki, and K. Goedicke, Fraunhofer-Institut für Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....402

Decorative and Functional TiN Coatings for Aluminum Bicycle Parts [73]
B.R. Anton, Vapor Technologies Inc., Longmont, CO; and P.C. Esquibel, RockShox Inc., Colorado Springs, CO.....407

Development and Production of IBED Cr₂N [74]
S.L. Ream, A.H. Deutchman, and R.J. Partyka, Worthington BeamAlloy, Dublin, OH.....412

Optical, Chemical, Structural, and Mechanical Properties of CrBN Coatings [75]
S.M. Aouadi, T.Z. Gorishnyy, S. Varma, and S.L. Rohde, University of Nebraska, Lincoln, NE.....417

Vacuum Web Coating

Polymer Film Deposition by a New Vacuum Process [76]
J. Affinito, Sion Power Corporation, Tucson, AZ.....425

Deposition of Titanium Dioxide by High-Rate, Ion-Assisted Electron Beam Evaporation [77]
N. Schiller, M. Krug, S. Straach, and M. Neumann, Fraunhofer-Institute Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....440

Cluster Layers for Surface Enhanced Absorption (SEA) [78]
H. Walter, G. Bauer, R. Domnick, and J. Hassmann, november AG, Erlangen, Germany.....443

The Stabilization of Reactive DC- and MF-Sputter Processes with Oxygen Partial Pressure Measurement [79]
P. Sauer, J. Bruch, R. Kukla, H.-G. Lotz, J. Trube, and T. Willms, Applied Films GmbH & Co. KG, Alzenau, Germany .....446

High-Rate PECVD on Web Accomplished with New Magnetically Enhanced Source [80]
J. Madocks, Applied Process Technologies, Inc., Tucson, AZ.....451

Calibration of an XRF Spectrometer for Thickness Determination of Ultra Thin Metal Layers on Polymers by RBS [81]
S. Zoister, R. Einsiedler, F. Kastner, and M. Bergsmann, Hueck Folien GmbH, Baumgartenberg, Austria; and M. Draxler and P. Bauer, Universität Linz, Linz, Austria.....457

Future Trends in Permeation Measurement [82]
R.D. Maixner, MOCON Inc., Minneapolis, MN.....461

Growth Modes of SiO₂ Films on Polymeric Substrates [83]
G. Dennler* and M.R. Wertheimer, École Polytechnique, Montréal, Canada; A. Houdayer, Université de Montréal, Montréal, Canada; and P. Raynaud, I. Séguy, and Y. Ségui, Université Paul Sabatier, Toulouse, France.....465

Ultra High Barrier Layers for Technical Applications [84]
H.-C. Langowski, A. Melzer, and D. Schubert, Fraunhofer Alliance Polymer Surfaces, Freising, Germany.....471

Polymer Web Surface Cleanliness [85]
C.A. Bishop, C.A. Bishop Consulting Ltd., Newby, Middlesbrough, N. Yorks, United Kingdom.....476

New Developments in Polyester Films for Display Applications [86]
W.A. MacDonald, J.M. Mace, and N.P. Polack, DuPont Teijin Films (UK) Limited, Middlesbrough, United Kingdom.....482

Deposition Technology of Transparent Conductive Coatings on PET Foils [87]
M. Fahland, C. Charton, and A. Klein, Fraunhofer Institute for Electron Beam and Plasma Technology, Dresden, Germany.....487

Basic Principles of Thin Film Barrier Coatings [88]
W. Decker, Toray Plastics (America), Inc., North Kingstown, RI; and B. Henry, University of Oxford, Oxford, United Kingdom.....492

Factors Affecting Water Vapor Permeation Through PET/AlOxNy Films [89]
A.G. Erlat, B.M. Henry, C.R.M. Grovenor, and G.A.D. Briggs, University of Oxford, Oxford, United Kingdom; and Y. Tsukahara, Toppan Printing Co., Ltd., Saitama, Japan.....503

Process Control and Defects Monitoring in Vacuum Web Coating [90]
A. Fusi and F. Rimediotti, Galileo Vacuum Systems, Prato, Italy.....509

Gas Permeation Studies of Metal Oxide/Polymer Composite Films [91]
B.M. Henry, A.G. Erlat, C.R.M. Grovenor, and G.A.D. Briggs, University of Oxford, Oxford, United Kingdom; and T. Miyamoto and Y. Tsukahara, Toppan Printing Co., Ltd., Saitama, Japan.....514

Layer Defects and the Synergetic Effect Between Inorganic and Organic Barrier Layers [92]
M. Hanika, Technical University of Munich, Garching, Germany; and H.-C. Langowski and U. Moosheimer, Fraunhofer-Institute for Process Engineering and Packaging, Freising, Germany.....519

PECVD of SiOx Barrier Films [93]
A.W. Smith, N. Copeland, D. Gerrerd, and D. Nicholas, Valmet General, Ltd., Heywood, United Kingdom.....525

Self-Healing Flexible Photonic Composites for Light Sources [94]
M.G. Mikhael and A. Yializis, Sigma Technologies International Inc., Tucson, AZ.....530

Web Coating with Lithium—Technical Solution for Metal Anode Structures in Li Batteries [95]
R. Swisher, Sheldahl, Inc., Northfield, MN; and E. Yadin and G. Pipkevich, Sidrabe, Inc., Riga, Latvia.....535

Pigments Exhibiting Diffractive Effects [96]
A. Argoitia and M. Witzman, Flex Products Inc., Santa Rosa, CA.....539

A New Method for Measuring Low Levels of Water Vapor Permeation Through Polymers and Permeation Barrier Coatings [97]
H. Nörenberg, G.D.W. Smith, and G.A.D. Briggs, University of Oxford, Oxford, United Kingdom; and T. Miyamoto and Y. Tsukahara, Technical Research Institute, Toppan Printing Company, Saitama, Japan.....546

Technical Poster Presentations

History of Mechanical Vacuum Pumps in the United States [98]
D.B Webb, Vacua Techniques Company, Alamo, CA.....551

Comparison of SiOxNy Thin Films Deposited by ECR-PECVD at 2.4 and 3.0 mTorr Total Pressure [99]
J. Wojcik and L. Chan, McMaster University, Hamilton, Ontario, Canada; W.N. Lennard, The University of Western Ontario, London, Ontario, Canada; and J.A. Davies and P. Mascher, McMaster University, Hamilton, Ontario, Canada.....558

Plasma-Enhanced CVD Deposited Diamond-Like Carbon Films for High-Density Magnetic Recording [100]
D. Ochs, M. Geisler, and B. Cord, Unaxis, Alzenau, Germany.....561

Gas Barrier Silica Films Deposited on Polyethyleneterephtalate by Low-Temperature Plasma-Enhanced CVD Using Organosilane Sources [101]
K. Teshima, Nagoya University, Nagoya, Japan and Dai Nippon Printing, Kashiwa, Japan; and Y. Inoue, H. Sugimura, and O. Takai, Nagoya University, Nagoya, Japan.....565

Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide [102]
D. Carter, H. Walde, G. McDonough, and G. Roche, Advanced Energy Industries, Fort Collins, CO.....570

Flexible a-Si:H Electrophotographic Photoreceptors [103]
M.D. Graham, Beckman Coulter, Inc., Nicholasville, KY.....578

Automated Vacuum Equipment for Deposition of Anti-Reflection Coatings on CRTs [104]
U. Shyrypau, A. Khakhlou, M. Leuchuk, and S. Maryshev, IZOVAC Ltd., Minsk, Belarus.....587

Deposition and Characterization of Perovskite Pb1-xLax(Zr,Ti)O₃ (PLZT) Thin Films by Combustion Chemical Vapor Deposition (CCVD) [105]
Y.D. Jiang, T.J. Metzger, X. Xu, T.A. Polley, and A.T. Hunt, MicroCoating Technologies, Inc., Atlanta, GA.....592

A Direct Method for Determining Thickness and Optical Constants of Thin Films [106]
D. Pekker, Rice University, Houston, TX; and L. Pekker, Deposition Sciences, Inc., Santa Rosa, CA.....599

Transparent, Conductive ITO for Telecommunication Wavelengths [107]
A. Voronov and F. Placido, Thin Film Centre, University of Paisley, Paisley, United Kingdom.....603

Influence of Substrate Temperature and Bias Voltage on the Optical Properties of Sputter Coated TiN Films [108]
H.Z. Durusoy and Ö. Duyar, Hacettepe University, Ankara, Turkey; and A. Aydinli and F. Ay, Bilkent University, Bilkent, Ankara, Turkey.....607

Plasma-Assisted Deposition of Precision Optical Coatings over Extended Areas [109]
D.R. Gibson, Satis Vacuum Industries Vertriebs AG, Baar, Switzerland; and C. Huiguang, Zhejiang Sunny Optics Co. Ltd, Yuyao, China.....611

Organic Polymeric Coatings Deposited by CVD/PECVD for Electornics Applications [110]
R.W. Sabnis, A.P. Farnsworth II, and S.S. Scott, Brewer Science Inc., Rolla, MO.....616

Vendor Poster Presentations

Non-Contaminating Magnetic Bearing/Motor—ISAM [111]
P.J. Morgan, Magmotor Power Systems, Brighton, MI.....621

The Integrated Solution: Cost Effective Automation from Pfeiffer Vacuum [112]
M. Trunca, Pfeiffer Vacuum, Inc., Nashua, NH.....623