2003 46th Technical Conference Proceedings

Note: Number in brackets on the top line is the paper number for 2003. *SVC Student Presenter

Plenary Session

Nanotechnology: Benefits, Challenges, and Risks [1]
A.D. Romig, Jr., and T.A. Michalske, Sandia National Laboratories, Albuquerque, NM.....3

Special Presentation

Foundations of Vacuum Coating Technology: the Stories Behind the Facts [2]
D.M. Mattox, Management Plus, Inc., Albuquerque, NM.....11

Process Control & Instrumentation

Integrated Process Control for Reactive Sputter Deposition of Dielectric Thin Films [3]
D. Carter, W.D. Sproul, and D. Christie, Advanced Energy Industries, Inc., Fort Collins, CO.....23

Real-Time Control of Thin-Film Photovoltaics Process [4]
B.S. Joshi, ITN Energy Systems Inc., Littleton, CO; T.L. Vincent, Colorado School of Mines, Golden, CO; N.B. Gomeza and I.L. Repins, ITN Energy Systems Inc., Littleton, CO; and J.S. Britt, Global Solar Energy, Inc., Tucson, AZ.....29

An Optical Sensor for Real-Time In-Situ Endpoint Monitoring During Dry Etching of Multi-Stack Layers [5]
E. Teboul, Y. Ji, and S. Maher, Thin Film Group, Edison, NJ; and E. Keyes and N. Aitken, Semiconductor Insights Inc., Kanata, Ontario, Canada.....33

Search for the Cause of Asymmetric Results of Monitoring Errors in DWDM Filters and the Benefits of Corrections in the Last Two Layers [6]
R.R. Willey, Willey Optical, Consultants, Charlevoix-the-Beautiful, MI.....37

Novel Instrumentation for Sensitive Measurements of High-Quality Optical Components [7]
D. Baer, M. Gupta, T. Owano, A. O’Keefe, and H. Jiao, Los Gatos Research, Mountain View, CA.....42

Decorative & Functional Coating

Plumbing Industry Use of PVD Coatings: Past, Present, and Future [8]
R. Herrbach, Plumbing Manufacturers Institute/Cifial USA, Atlanta, GA.....49

Cohesive Strength and Oxygen Permeability of PECVD-Based Coatings on Semicrystalline Polymers [9]
G. Rochat* , J. Bouchet, Y. Leterrier, and J.-A.E. Manson, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland; and S. Robert and P. Fayet, Tetra Pak (Suisse) SA, Plasma Technology, Romont, Switzerland.....50

A Systematic Study of the Properties of the Zr-C-N Ternary System, Deposited by Reactive Arc Evaporation [10]
M. Eerden, W. van Ijzendoorn, R. Tietema, and G.J. van der Kolk, Hauzer Techno Coating, Venlo, The Netherlands.....56

Performance of High-Precision Knife Blades Treated by Plasma Nitriding and PVD Coating [11]
P.E. Hovsepian, A.P. Ehiasarian, W.-D. Münz, and D.B. Lewis, Sheffield Hallam University, United Kingdom; and G. Thompson, Swann-Morton Ltd., Sheffield, United Kingdom.....61

Throwing- and Covering-Power Assessment: PVD Application [12]
K. Brondum, Vapor Tech Inc., Longmont, CO.....67

Emerging Technologies

Novel Electrochromic Materials and Devices [13]
C.G. Granqvist, E. Avendaño, and A. Azens, Uppsala University, Uppsala, Sweden.....75

A Novel Large Area Ion Plating Process [14]
M.H. Sohn and N.W. Paik, Plasmion Corporation, Hoboken, NJ.....81

Deposition of Coatings via Atmospheric Plasma-Enhanced CVD [15]
D.P. Dinega, A.M. Gabelnick, and C.A. Lambert, The Dow Chemical Company, Midland, MI.....85

Ultrabarrier Protective Coatings for Atmospherically Sensitive Thin-Film Electronic Devices [16]
M.E. Gross, P.M. Martin, L.C. Olsen, G.L. Graff, P.E. Burrows, C.C. Bonham, and W.D. Bennett, Pacific Northwest National Laboratory, Richland, WA; and P.L. Rissmiller and E.L. Dudeck, Mine Safety Appliances Company, Sparks, MD.....89

Investigating the Effect of Ion Flux and Electron Temperature for Plasma Polymerization of Acrylic Acid [17]
M. Dhayal*, Department of Physics, UMIST, Manchester, United Kingdom; M.R. Alexander, Corrosion and Protection Centre, UMIST, Manchester, United Kingdom; and J.W. Bradley, Department of Physics, UMIST, Manchester, United Kingdom.....93

Control of the Reactive Sputtering Process Using Two Reactive Gases [18]
W.D. Sproul, D.J. Christie, and D.C. Carter, Advanced Energy Industries, Inc., Fort Collins, CO; and S. Berg and T. Nyberg, Uppsala University, Uppsala, Sweden.....98

New Hybrid Source with Microwave and Hollow Cathode Plasma [19]
L. Bárdos and H. Baránková, Uppsala University, Uppsala, Sweden.....104

Correlation Between Optical and Mass Spectrometry Characterization of an Atomic Nitrogen Source for Reactive Magnetron Sputtering [20]
T. Godfroid*, J.-P. Dauchot, and M. Hecq, Universite de Mons-Hainaut, Mons, Belgium.....108

Substrate Biasing in Pulsed DC Reactive Sputtering of Dielectrics [21]
A. Freilich, Stevens Institute of Technology, Hoboken, NJ; A. Belkind, Abe Belkind & Associates, Inc., North Plainfield, NJ; and K. Becker and J. Lopez, Stevens Institute of Technology, Hoboken, NJ.....114

Static Mode Hollow Cathode Reactive Sputtering [22]
A.A. Pradhan*, Dept. of Materials Science and Engineering, University of Delaware, Newark, DE, and Fraunhofer Center for Manufacturing and Advanced Materials, Newark, DE; and S.I. Shah, Dept. of Materials Science and Engineering, Dept. of Physics and Astronomy, University of Delaware, Newark, DE, and Fraunhofer Center for Manufacturing and Advanced Materials, Newark, DE.....120

Si/SiGe Superlattices For Thermoelectric Applications [23]
P.M. Martin and L.C. Olsen, Pacific Northwest National Laboratory, Richland, WA.....126

Pulsed DC, Gas-Flow Hollow Cathode Discharge: a Source for Sputter-Deposition [24]
C. Paduraru, A. Belkind, K. Becker, and J. Lopez, Stevens Institute of Technology, Hoboken, NJ; and A. Delahoy and S.Y. Guo, Energy Photovoltaics, Inc., Princeton, NJ.....130

Heuréka! Post-Deadline Recent Developments Session

High Rate PECVD Source for Flexible Substrates [25]
J. Madocks, Applied Process Technologies, Inc., Tucson, AZ .....137

Initial Capability of New Photomask-Blank Deposition Tool [26]
M.D. Kriese, J.L. Wood, J.R. Rodriguez, and G. Fournier, Osmic Inc, Auburn Hills, MI; and D.L. Thompson, D. Mercer, J.A. Gass, and D.E. Mauldin, Rohwedder Inc., Oviedo, FL.....143

New Type of High Voltage Power Supply for Electron Beam Web Coaters [27]
A. Thiede, HIGHVOLT Prüftechnik Dresden GmbH, Dresden, Germany; and R. Ludwig, W. Guhr, and G. Klemm, Applied Films GmbH & Co. KG, Alzenau, Germany.....149

PVD of Hard Films Inside Narrow Holes and Barrels [28]
L. Bárdos and H. Baránková, Uppsala University, Uppsala, Sweden.....154

Carbon Thin Film Deposition Using High Power Pulsed Magnetron Sputtering [29]
B.M. DeKoven, P.R. Ward, and R.E. Weiss, Intevac, Inc., Santa Clara, CA, and D.J. Christie, R.A. Scholl, W.D. Sproul, and F. Tomasel, Advanced Energy Industries, Inc., Fort Collins, CO; and A. Anders, Lawrence Berkeley National Laboratory, Berkeley, CA.....158

Joint Session on Displays

Mechanical Properties of Transparent Functional Thin Films for Flexible Displays [30]
Y. Leterrier, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland; and C. Fischer, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland and University of Utah, Salt Lake City, UT; and L. Médico, F. Demarco, and J.-A. E. Manson, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland; and P.C.P. Bouten, J. de Goede, and G. Nisato, Philips Research Laboratories, Eindhoven, The Netherlands; and J.A. Nairn, University of Utah, Salt Lake City, UT.....169

Large Area Sputter Deposition of Novel Transparent Conductive Oxide Materials for Displays Application [31]
U. Betz, J. Marthy, and F. Atamny, UNAXIS Balzers AG, Balzers, Liechtenstein.....175

Development of Antireflection Coatings Using Microwave Plasma-Enhanced Chemical Vapor Deposition [32]
C.A. Outten, A. Haeri, P. Mounier, and J. Jones, Southwall Technologies Inc., Tempe, AZ .....181

Recent Developments in the Deposition of ITO and AR Coatings [33]
E. Yadin, V. Kozlov, and E. Machevskis, Sidrabe, Inc., Riga, Latvia.....185

Tailoring of Ag Thin Films for Solar Control and Transparent Conductive Coatings [34]
C. Charton and M. Fahland, Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik, Dresden, Germany .....190

Resistivity and Microstructure Issues in Indium-Oxide Based Films Grown by RF Magnetron Sputtering on Flexible Polyester Substrates [35]
P.F. Carcia, R.S. McLean, M.H. Reilly, and Z.G. Li, DuPont Research & Development, Wilmington, DE; and L.J. Pillione and R.F. Messier, Materials Research Laboratory, University Park, PA.....195

Large Area Coating

The Use of Titanium Dioxide Coatings Deposited by APCVD on Glass Substrates to Provide Dual Action and Self Cleaning [36]
K.D. Sanderson, Pilkington plc, Lancashire, United Kingdom; A. Mills, University of Strathclyde, Glasgow, United Kingdom; I. Parkin, University College London, London, United Kingdom; S. Hurst, Pilkington plc, Lancashire, United Kingdom; A. Lepre, University of Strathclyde, Glasgow, United Kingdom; T. McKittrick, D. Rimmer, and L. Ye, Pilkington plc, Lancashire, United Kingdom; and S. O’Neill, University College London, London, United Kingdom.....203

High-Rate Reactive Deposition of Titania from Rotating Cylindrical Magnetrons with Plasma Emission Monitoring [37]
P. Greene, J. Rietzel, and S. Nadel, Von Ardenne Coating Technology, Fairfield, CA; and J. Strümpfel, C. May, and G. Teschner, Von Ardenne Anlagentechnik, Dresden, Germany.....209

Large Area Metal Strip Coating by EB-PVD—Current Aims and Physical Limits [38]
E. Reinhold, J. Richter, U. Seyfert, and C. Steuer, Von Ardenne Anlagentechnik GmbH, Dresden, Germany.....214

Emergent Technologies for Large Area PVD Coating of Metal Strips [39]
Chr. Metzner, B. Scheffel, J.-P. Heinss, and F.-H. Roegner, Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....222

Ex-Situ Ellipsometric Studies of Ag-Films Using the UV Regime of the c-Spectra [40]
J.-P. Müller, Guardian Luxcoating 1 S.A., Bascharage, Luxembourg; and G. Neuman and V.S. Veerasamy, Guardian Industries Corporation, Carleton, MI.....227

New Developments for Highly Flexible In-line Sputter Systems for Architectural Glass Coating [41]
D. Schulze, E. Mädler, W. Erbkamm, C. Hecht, J. Melcher, and F. Milde, Von Ardenne Anlagentechnik GmbH, Dresden, Germany; and R. Hill, Von Ardenne Coating Technology, Inc., Fairfield, CA.....233

Process Simulation for Advanced Large Area Optical Coatings [42]
A. Pflug, B. Szyszka, V. Sittinger, and J. Niemann, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany.....241

Rotating Cylindrical Magnetron Sputtering: Aspects Influencing the Sputter Deposition Yield in Large Area Coating Applications [43]
A. Blondeel, Bekaert VDS, Deinze, Belgium; and W. De Bosscher, Bekaert Advanced Coatings, Zulte, Belgium.....248

MF Twin Magnetron-Sputtered Silicon Nitride-Based Temperable Solar Control Coatings [44]
A. Zmelty, A. Reus, M. Ruske, and M. Geisler, Applied Films GmbH & CoKG, Alzenau, Germany.....253

Power System Requirements for Enhanced Mid-Frequency Process Stability [45]
D.J. Christie and E.A. Seymour, Advanced Energy Industries, Inc., Fort Collins, CO.....257

Linear Anode-Layer Ion Sources with 340- and 1500-mm Beams [46]
D. Burtner, R. Blacker, J. Keem, D. Siegfried, and E. Wahlin, Veeco Instruments, Inc., Fort Collins, CO.....263

Improvements in High-Power Generators and System Control for Large Area Coatings [47]
T. Rettich and P. Wiedemuth, Hüttinger Elecktronik GmbH Co. KG, Freiburg, Germany; and L. Anderson, Huettinger Electronic Inc., Farmington, CT.....269

Ga-Doped ZnO Thin Films by DC Magnetron Sputtering Using H₂/Ar Gas [48]
S. Takeda and M. Fukawa, Asahi Glass Co., Ltd., Yokohama, Japan.....272

Adaptive Glazing—Technologies, Applications, and Market [49]
H. Hagenström, Interpane, Lauenforde, Germany.....275

Deposition of SnO2 Coatings Using a Rectangular Filtered Vacuum Arc Source [50]
R.L. Boxman, V. Zhitomirsky, S. Goldsmith, T. David, and V. Dikhtyar, Tel Aviv University, Tel Aviv, Israel.....278

Optical Coating

Micro- and Nano-structured Materials for Active Devices and Molecular Electronics [51]
P.M. Martin, G.L. Graff, M.E. Gross, P.E. Burrows, W.D. Bennett, E. Mast, M.J. Hall, C.C. Bonham, M. Zumhoff, and R. Williford, Pacific Northwest National Laboratory, Richland, WA.....287

Direct Forgery-Proof Thin Film Coatings on Products [52]
R. Domnick, M. Belzner, G. Bauer, J. Hassmann, and H. Walter, november AG, Erlangen, Germany.....292

Optical Coatings (Nb₂O₅, Ta₂O₅ and WO₃) for LAC-Applications Obtained by DC Quasireactive Magnetron Sputtering of Ceramic Sputtering Targets [53]
A. Schintlmeister and P. Wilhartitz, Plansee AG, Reutte, Austria.....296

Durable Ultra-Hydrophobic Glass Coatings With Optical Quality [54]
K. Reihs, N. Malkomes, P. Müller, S. Renker, O. Stahlschmidt, R. Claessen, and P. Cavaleiro, SuNyx Surface Nanotechnologies GmbH, Köln, Germany; and A. Duparré, Fraunhofer Institut für Angewandte Optik und Feinmechanik (IOF), Jena, Germany.....302

Improving Rate Control in Electron-Beam Evaporated Optical Coatings [55]
|M. Gevelber, B. Xu, and N. Duanmu, Boston University, Brookline, MA; and D. Smith, Vacuum Process Technology Inc., Plymouth, MA.....305

Developments in Thin Film Optics [56]
K. Lewis, QinetiQ, Malvern, United Kingdom.....311

Luminescent Devices with Symmetrical and Asymmetrical Microcavity Structures [57]
D. Poitras and D. Dalacu, National Research Council of Canada, Ottawa, Canada; X. Liu, National Capital Institute of Telecommunications and National Research Council of Canada, Ottawa, Canada; and J. Lefebvre, P.J. Poole, and R. L. Williams, National Research Council of Canada, Ottawa, Canada.....317

Bandpass Filters for 40 Gbit/sec [58]
D. Cushing, 3M Precision Optics, Inc., Cincinnati, OH.....323

All-Dielectric Front Surface Non-Polarizing Beam Splitter [59]
P. Ma, P. Verly, J.A. Dobrowolski, and F. Lin, National Research Council of Canada, Ottawa, Canada.....328

Optical Monitoring of a Zinc Sulfide Film [60]
P. Baumeister, Sholem Consultants, Sebastopol, CA.....332

Microstructure of SiO₂/TiO₂ Coatings and Their Use in Graded-Index Optical Filters [61]
S. Larouche*, H. Szymanowski, A. Amassian, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique, Montréal, Canada.....334

Methods for Improving Accuracy of Optical Coating Analysis from Spectrophotometric Measurements [62]
J.C. Zwinkels and M. Noël, National Research Council of Canada, Ottawa, Ontario, Canada.....339

The Effects of Process Variations on Color Control Coatings [63]
I. Stevenson, G. Sadkhin, and J. DiPaolo, Denton Vacuum, LLC, Moorestown, NJ; J. Kruschwitz, JK Consulting, Rochester, NY; and D. Jesurun, STERIS Corporation, Mentor, OH.....345

Optimization of Deposition Uniformity for Large Aperture NIF Substrates in a Planetary Rotation System [64]
J.B. Oliver and D. Talbot, University of Rochester, Rochester, NY.....353

Cleaning of Parts for Precision-Optic and Glass Substrates Before Coating [65]
J. Strobel and R.M. Hohl, UCM AG, Rheineck, Switzerland.....359

Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control [66]
J.N. Hilfiker, B. Johs, J. Hale, C.M. Herzinger, T.E. Tiwald, C.L. Bungay, R.A. Synowicki, G.K. Pribil, and J.A. Woollam, J.A. Woollam Company, Lincoln, NE.....365

Direct Ion Beam Chemical Vapor Deposition of SiO₂-Like Materials Using a Closed-Drift Ion Source [67]
B. Knapp and S. Finke, Morgan Advanced Ceramics, Inc. - Diamonex Products, Allentown, PA.....371

Influences of Pulse Parameters on Properties of Optical Coatings Deposited by Reactive Pulsed Magnetron Sputtering [68]
R. Vanecek, J.S. Liebig, and H. Sahm, Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....377

Chemical Vapor Deposition of High Precision Optical Coatings [69]
M.L. Hitchman, S.H. Shamlian, and D.R. Gibson, Thin Film Innovations Ltd., Scotland, United Kingdom.....383

Closed Field Magnetron Sputtering: a New Strategy for Multilayer Optical Coatings [70]
J.M. Walls, D.R. Gibson, and I. Brinkley, Applied Multilayers Ltd., Leicestershire, United Kingdom; and D.G. Teer, P. Teer, and J. Hampshire, Teer Coatings Ltd., Worcestershire, United Kingdom.....387

Mid-Frequency Dual Magnetron Reactive Co-Sputtering for Deposition of Customized Index Optical Films [71]
D.J. Christie, W.D. Sproul, and D. Carter, Advanced Energy Industries, Inc., Fort Collins, CO.....393

Omnidirectional Mirror Coating Design for IR Applications [72]
D. Lusk and F. Placido, University of Paisley, Scotland, United Kingdom.....399

RF Plasma Deposition of a Ge:C:H Type Amorphous Superlattice Structures [73]
M. Gazicki-Lipman and R. Mazurczyk, Technical University of Lodz, Lodz, Poland.....405

Design of Multi-Band Square Band Pass Filters [74]
D. Morton, Denton Vacuum, Moorestown, NJ.....411

Multilayer Coating Technologies for Extreme Ultraviolet Lithography Applications [75]
C. Montcalm, Xenocs, Sassenage, France; Veeco Instruments Inc., Plainview, NY; and Lawrence Livermore National Laboratory, Livermore, CA.....416

Thermal Stress in Antireflective Coatings on Polymer Substrates [76]
U. Schulz and N. Kaiser, Fraunhofer Institute of Applied Optics and Precision Engineering, Jena, Germany.....419

Plasma Processing

Cold Atmospheric Plasma Sources for Surface Treatment [77]
H. Baránková and L. Bárdos, Uppsala University, Uppsala, Sweden.....427

Plasma and Ion Beam Surface Engineering for Practical Applications [78]
R. Wei, J. Arps, and B. Lanning, Southwest Research Institute, San Antonio, TX.....431

Influence of Steering Magnetic Field on the Composition and Intensity of the Ion Flux Generated in Arc Discharges [79]
A.P. Ehiasarian, P.E. Hovsepian, R. New, and W.-D. Münz, Sheffield Hallam University, Sheffield, United Kingdom.....437

Magnetron as Cathode-Neutralizer for Ion Source in Ion-Assisted Operation [80]
V.V. Zhurin, H.R. Kaufman, J.R. Kahn, and K.A. Thompson, Kaufman & Robinson, Inc., Fort Collins, CO.....442

Characterizations of Electron Beam-Generated Plasmas [81]
S.G. Walton, D. Leonhardt, R.F. Fernsler, and R.A. Meger, Naval Research Laboratory, Washington, DC; D.D. Blackwell, SFA, Inc., Largo, MD; and C. Muratore, ASEE/NRL Postdoctoral Research Associate, Washington, DC.....447

A Study of an Ionized Magnetron Source by Pulsed Absorption Spectroscopy [82]
S. Konstantinidis*, Université de Mons-Hainaut, Mons, Belgium; A. Ricard, Université Paul Sabatier, Toulouse, France; M. Ganciu-Petcu, National Institute for Laser, Plasma and Radiation Physics, Bucharest, Romania; and J.-P. Dauchot, M. Wautelet, and M. Hecq, Université de Mons-Hainaut, Mons, Belgium.....452

Variable Duty Cycle Pulsed Discharges to Control Coating Compositions During RF Plasma Polymerizations [83]
J. Cho and R.B. Timmons, University of Texas at Arlington, Arlington, TX; and H. Qiu, STMicroelectronics, Carrollton, TX.....457

Plasma Surface Technologies in Germany [84]
R. Fellenberg, VDI Technology Center, Duesseldorf, Germany; and G. Braeuer, Fraunhofer Institute for Electron Beam and Plasma Technology, Dresden and Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany.....462

New Design of Plasma Technique and Processes with Medium-Pressure Microwave Plasma [85]
H. Sung-Spitzl and R. Spitzl, iplas Innovative Plasma Systems GmbH, Troisdorf, Germany.....469

Submerged Arc Synthesis of Carbon/Iron-Based Magnetic Nanoparticle Systems [86]
F.S. Denes and S. Manolache, University of Wisconsin, Madison, WI; and S. Prokes, B. Ravel, and V.A. Shamamian, Naval Research Laboratory, Washington, DC.....472

Plasma Parameters During Thin Film Deposition [87]
H. Bäcker* and J.W. Bradley, UMIST, Manchester, United Kingdom; and P.S. Henderson and P.J. Kelly, University of Salford, Salford United Kingdom.....479

Microwave Plasma Barrier Coating Technology for PET Beverage Containers [88]
C. Weikart and T. Smith, The Dow Chemical Company, Midland, MI.....486

Pulse Packet Switching for Reactive Magnetron Sputtering—A New Method to Control the Process [89]
R. Nyderle, T. Winkler, and R. Labitzke, Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....491

Dissection of the Planar Magnetron Discharge [90]
G. Buyle, D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, State University Ghent, Ghent, Belgium; and W. De Bosscher, Bekaert Advanced Coatings (Bekaert VDS), Deinze, Belgium.....497

New Plasma Source for Assisted Reactive Evaporation and IBAD Applications [91]
J. Madocks, Applied Process Technologies, Inc., Tucson, AZ .....504

An Application of RF Plasma to the Surface Modification of Powdered Materials: Hydrophobization of Potato Starch [92]
M. Kaczmarek, M. Gazicki-Lipman, L. Klimek, and H. Szymanowski, Technical University of Lodz, Lodz, Poland.....510

Tribological & Wear Coating

PVD Wear Coatings: Anatomy of a Component Coating Application [93]
R. Hawbaker and S. Taylor, Caterpillar Inc., Peoria, IL.....519

Development and Characterization of Magnetron Sputtered Al-Mo Coatings [94]
M. Bielawski and R.C. McKellar, National Research Council of Canada, Ottawa, Ontario, Canada.....525

Mechanical Properties of Hard SiCN Coatings Prepared by PECVD [95]
P. Jedrzejowski, École Polytechnique, Montreal, Canada; J. Cizek, University of West Bohemia, Plzen, Czech Republic; A. Amassian and J.E. Klemberg-Sapieha, École Polytechnique, Montreal, Canada; J. Vlcek, University of West Bohemia, Plzen, Czech Republic; and L. Martinu, École Polytechnique, Montreal, Canada.....530

Large-Scale PVD Hard Coating Process for Tribological Applications [96]
M. Ma, Wilsonart International, Inc. Temple, TX.....535

Plasma Deposition of Diamond-Like Protective Coating with Silicon Oxide Content [97]
P. Dvorák*, L. Zajícková, V. Bursíková, and M. Valtr, Masaryk University, Brno, Czech Republic; and J. Houdková, Czech Academy of Science, Praha, Czech Republic; and V. Perina and A. Mackova, Institute of Nuclear Physics, Rez, Czech Republic.....541

Design and Operation of Modern PVD Coating Machines [98]
A. Schütze, V. Derflinger, A. Reiter, R. Schmid, and D.T. Quinto, Balzers Ltd., Balzers, Principality of Liechtenstein.....546

Vacuum Web Coating

Vacuum Surface Functionalization of Paper and Woven or Nonwoven Materials [99]
A. Yializis and M.G. Mikhael, Sigma Technologies International Inc., Tucson, AZ.....553

Flexible Barrier Materials for Technical Applications [100]
H.-C. Langowski, Fraunhofer Institute for Process Engineering and Packaging, Freising, Germany.....559

Novel Security Feature Made by Thin Film Coating Technique [101]
M. Bergsmann and F. Kastner, Hueck Folien GmbH, Baumgartenberg, Germany; and G. Bauer, R. Domnick, and H. Walter, november AG, Erlangen, Germany.....566

Solar Reflective Material Produced Using a Laboratory-Scale Roll Coater [102]
R.V. Smilgys, Science Applications International Corporation, McLean, VA; and C.E. Kennedy, National Renewable Energy Laboratory, Golden, CO.....570

Property Control of Transparent Conducting Oxides [103]
J.L. Linden, A.M.B. van Mol, and C.P.G. Schrauwen, TNO-TPD, Eindhoven, The Netherlands; R. Groenen and M.C.M. van de Sanden, Eindhoven University of Technology, Eindhoven, The Netherlands; and A.D. Kuypers, TNO - TPD, Eindhoven, The Netherlands.....576

Slot Sources: a Replacement for Resistance-Heated Boats in Aluminum Metallizers? [104]
CA. Bishop, C.A.Bishop Consulting Ltd., Middlesbrough, United Kingdom.....580

Plasma-Enhanced Chemical Vapor Deposition of Transparent Barrier Coatings [105]
G. Czeremuszkin and M. Latreche, Nova-Plasma Inc., Montréal, Quebec, Canada; and M.R. Wertheimer, École Polytechnique, Montréal, Quebec, Canada.....586

Simulation and Verification of Defect-Dominated Permeation Mechanisms in Multiple Structures of Inorganic and Polymeric Barrier Layers [106]
M. Hanika, Technical University of Munich, Institute of Particle Technology, Garching, Germany; H.-C. Langowski, Fraunhofer-Institute for Process Engineering and Packaging, Freising, Germany; and W. Peukert, University Erlangen-Nuremberg, Institute of Particle Technology, Erlangen, Germany.....592

Permeation Studies of Transparent Barrier Coatings [107]
B.M. Henry, A.G. Erlat, C.R.M. Grovenor, and G.A.D. Briggs, University of Oxford, Oxford, United Kingdom; and T. Miyamoto and Y. Tsukahara, Toppan Printing Co., Ltd., Saitama, Japan.....600

Vacuum Coated Layers Measure and Control: Innovations for Web Coating Applications [108]
M. Lasagni and A. Colombo, Galileo Vacuum Systems, Prato, Italy.....606

Poster Presentations

Gas Implantation in Sputter Targets as a Factor Determining the Target Voltage in Reactive Sputtering [109]
R. De Gryse, D. Depla, and J. Haemers, University Ghent, Ghent, Belgium.....615

Substrate Heating Using Several Configurations of an End-Hall Ion Source [110]
J.R. Kahn, H.R. Kaufman, and V.V. Zhurin, Kaufman & Robinson, Inc., Fort Collins, CO.....621

Turbomolecular Pumps for Large-Area Coating from Pfeiffer Vacuum [111]
M. Trunca, Pfeiffer Vacuum, Inc., Nashua, NH.....626

Synthesis and Characterization of SiAlON Thin Film Coatings [112]
J.I. Krassikoff*, G.P. Bernhardt, M. Call, T.A. Dunn, D.D. More, and R.J. Lad, Laboratory for Surface Science & Technology, University of Maine, Orono, ME.....627

Product & Technology Forum Presentations

Varian Inc.’s New Turbo-V 2K-G Turbomolecular Vacuum Pump for Thin Film Deposition [113]
W. Vissers, B. Foley, and S. Palmer, Varian Inc., Vacuum Technologies, Lexington, MA.....633

R&D Services for the Vacuum Web Coating Industry [114]
N. Schiller, C. Charton, R. Rank, and M. Fahland, Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany.....634

Sputtering System for Cleanroom Installation [115]
D.W. Konopka and M. Styonavich, Denton Vacuum, LLC, Moorestown, NJ.....635

Large-Scale Production of Reflectors by Integrating Plasma Pretreatment, Sputtering, and Plasmapolymerization in a One-Chamber Coater [116]
K. Nauenburg, U. Braun, W. Dicken, G. Ickes, and M. Röder, Leybold Optics GmbH, Alzenau, Germany.....636

Developments in Tarnish-Resistant Silver Alloys [117]
G.M. Wityak, Academy Precision Materials, Albuquerque, NM.....637

*SVC Student Presenter