2005 48th Technical Conference Proceedings

Process Control & Instrumentation

A Multi-Zone, Multi-Gas Reactive Sputtering Control System [1]
W.D. Sproul, Reactive Sputtering Consulting, LLC, Fort Collins, CO; and D.J. Christie and D.C. Carter, Advanced Energy Industries, Inc., Fort Collins, CO ..... 3

Long-Term Process Control and Stability in Reactive Sputtering [2]
V. Bellido-Gonzalez, B. Daniel, J. Counsell, and D.P. Monaghan, Gencoa Ltd., Liverpool, United Kingdom ..... 9

Pole Pieces Insertion in Target for NiCr Magnetron Sputtering: Influence on Plasma and Coating Properties [3]
C. Nouvellon, Materia Nova, Mons, Belgium; P. Lefèvre, Alloys For Technical Applications, Achêne, Belgium; and J.P. Dauchot and M. Hecq, Materia Nova, Mons, Belgium ..... 14

Coating of Powder Particles in a Magnetron Plasma [4]
H. Kersten and G.Thieme, Institute for Low-Temperature Plasma Physics, Greifswald, Germany; R. Hippler, University of Greifswald, Department of Physics, Greifswald, Germany; and K.-D. Weltmann, Institute for Low-Temperature Plasma Physics, Greifswald, Germany ..... 18

Spectroscopic Mueller Matix (MM) Polarimeter Using Liquid Crystal Device Polarization State Generator (PSG) and Detector (PSD) Applications [5]
E. Garcia-Caurel and A. De Martino, École Polytechnique, Palaiseau, France; R. Ossikovsky, Horiba Jobin Yvon, Chilly-Mazarin, France; T. Novikova and B. Drevillon, École Polytechnique, Palaiseau, France; A. Kramer, Horiba Jobin Yvon, Edison, NJ; and Y. Ji, Horiba Jobin Yvon, Sunnyvale, CA ..... 23

On the Application of Quantum Cascade Laser-Absorption Spectroscopy for Plasma Process Monitoring [6]
J. Röpcke, S. Glitsch, F. Hempel, and S. Saß, INP-Greifswald, Greifswald, Germany; K.-D. Schulz, Schulz & Walter Elektronik GmbH, Kemnitz, Germany; and K.-D. Weltmann and H. Zimmermann, NP-Greifswald, Greifswald, Germany ..... 27

True 2D Imaging Spectroscopy in a Reactive Sputter Process for Large Scale Optical Glass Coating [7]
S. Marke and T. Wallendorf, IfU Diagnostic Systems GmbH, Lichtenau, Germany; and F. Milde, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany ..... 30

An Optical Sensor for Real-Time In situ Endpoint Monitoring During Dry Etching of Multi-stack Layers [8]
E. Teboul, Y. Ji, and A. Kramer, HORIBA Jobin Yvon Inc., Edison, NJ; and P. Amary and R. Benherhat, Horiba Jobin Yvon, Chilly-Mazarin, France ..... 34

Arc Handling Considerations for DC Sputtering Power Supplies [9]
D.J. Christie, H.V. Walde, and T.J. Ash, Advanced Energy Industries, Inc., Fort Collins, CO ..... 39

Managing Arcs in RF Powered Plasma Processes [10]
G. van Zyl and R. Heckman, Advanced Energy Industries, Inc., Fort Collins, CO ..... 44

Emerging Technologies

Nanocomposite Mo-Ti-N Coatings for Wear Resistant Applications [11]
D. Glocker, Isoflux Incorporated, Rochester NY; and M. Graham, R. Hoffman, A. Madan, and J.-S. Wang, Northwestern University, Evanston, IL ..... 53

Processes of Multilayer Coatings Deposition Onto Powder Materials and Equipment for Such Processes [12]
E. Yadin, V. Kozlov, Y. Ruljov, and I. Ashmanis, Sidrabe, Inc., Riga, Latvia  ..... 58

Time-resolved Optical Emission Spectroscopy During Pulsed DC Magnetron Sputter Deposition of TiO₂ Thin Films [13]
W. Zhu, J. Lopez, and A. Belkind, Dept. of Physics and Eng. Physics, Stevens Institute of Technology, Hoboken, NJ; and K. Becker, Dept. of Physics and Eng. Physics, and Center for Environmental Systems, Stevens Institute of Technology, Hoboken, NJ ..... 62

In Situ Growth Monitoring of Nanocomposite TiN/SiN1.3 and TiCxNy/SiCN Films Using Spectroscopic Ellipsometry [14]
P. Jedrzejowski, A. Amassian, E. Bousser, L. Martinu, and J.E. Klemberg-Sapieha, École Polytechnique, Montréal, Québec, Canada ..... 68

Low Outgassing of Silicon-Based Coatings on Stainless Steel Surfaces for Vacuum Applications [15]
D.A. Smith and M.E. Higgins, Restek Performance Coatings, Bellefonte, PA; and B.R.F. Kendall, Elvac Laboratories, Bellefonte, PA ..... 74

PVD of Films on Ferromagnetic Substrates in Magnetized Plasma Systems [16]
L.-E. Gustavsson, H. Baránková, and L. Bárdos, Uppsala University, Uppsala, Sweden ..... 79

Future Space-Based Deposition Technology for Solar Power and Astronomical Applications [17]
M.L. Fulton, Ion Beam Optics, Inc., Thousand Oaks, CA ..... 83

Initiated Chemical Vapor Deposition (iCVD) of Polymer Thin Films [18]
H.G. Pryce Lewis, GVD Corporation, Cambridge, MA; and K.K.S. Lau, Y. Mao, and K.K. Gleason, Massachusetts Institute of Technology, Cambridge, MA ..... 90

Characterization of a High Output Gridless Ion Source [19]
D. Gardner, Macquarie University, Sydney, Australia; and W. Sainty, Saintech Ion Beam Systems, Sydney, Australia ..... 95

Heuréka! Post-Deadline Recent Developments Session

Improved Reactive Sputtering Control Through Application of Higher Speed Mass Flow Controllers [20]
M.A. George and M.K. Rains, Deposition Sciences Incorporated, Santa Rosa, CA ..... 103

Control of Thickness Uniformity in a Filtered Cathodic Vapor Arc System [21]
J. Arkwright, P. Martin, A. Bendavid, and E. Preston, CSIRO Industrial Physics, Lindfield, Australia ..... 108

Rotating Cylindrical ITO Targets for Large Area Coating [22]
W. De Bosscher, Bekaert Advanced Coatings N.V., Zulte, Belgium; and H. Delrue, J. Van Holsbeke, S. Matthews, and A. Blondeel, Bekaert Advanced Coatings N.V., Deinze, Belgium ..... 111

Ultra-High Barrier Coatings for Flexible Organic Electronics [23]
A.G. Erlat, M. Yan, T.W. Kim, M. Schaepkens, J. Liu, C.M. Heller, P. McConnelee, T. Feist, and A.R. Duggal, General Electric Global Research Center, Schenectady, NY ..... 116

An Electrodeless High Density Plasma Source for Large Area Thin-film Processing [24]
R. Jewett, Sencera, Charlotte, NC and Advanced Energy Industries, Fort Collins, CO; and S. Pugh, Sencera, Charlotte, NC; and A. Shabalin, Advanced Energy Industries, Fort Collins, CO ..... 121

High Density Plasma Deposition [25]
P.J. Hockley and M.J. Thwaites, Plasma Quest Limited, Hook, United Kingdom; and G. Dion, System Control Technologies, Livermore, CA ..... 125

Time-Resolved Imaging of a Pulsed DC Magnetron Plasma During the Sputter Deposition of TiO₂ Films [26]
W. Zhu, J. Lopez, L. Shanmugamurthy, A. Belkind, and K. Becker, Stevens Institute of Technology, Hoboken, NJ ..... 131

Plasma-assisted Co-evaporation of Thin Film Semiconductors [27]
S. Kosaraju, J. Harvey, and C.A. Wolden, Colorado School of Mines, Golden, CO ..... 136

Joint Session: Processes, Materials, and Systems for Flexible Electronics and Optics

Using Vacuum Roll Coaters to Produce Anti-Counterfeiting Devices [28]
R.W. Phillips and A. Argoitia, JDSU - Flex Products Group, Santa Rosa, CA ..... 145

Organic Light Emitting Diode Thin Film Structure Characterization by Phase Modulated Spectroscopic Ellipsometry [29]
A. Kramer, Horiba Jobin Yvon, Edison, NJ; Y. Ji, Horiba Jobin Yvon, Sunnyvale CA; and E. Teboul, Horiba Jobin Yvon, Edison, NJ; and M. Stchakovsy, C. Marchand, and M. Gaillet, Horiba Jobin Yvon, Chilly-Mazarin, France ..... 153

PECVD Processed Silicon Carbide Coatings for Organic Luminescent Devices [30]
W.K. Weidner, L.M. Zambov, V.A. Shamamian, S.V. Perz, R.C. Camilletti, S.A. Snow, M.J. Loboda, and G.A. Cerny, Dow Corning Corporation, Midland, MI ..... 158

Permeation Barrier Coatings for Flexible Electronics and Polymer/inorganic Layer Interphase Development in an Expanding Thermal Plasma [31]
M. Creatore, V.I.T.A. Lohmann, C.G. Klaasse Bos, and A.C.M. Hamelinck, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands; M.M. Koetse and H.F.M. Schoo, TNO Science and Industry, Eindhoven, The Netherlands; and M.C.M. van de Sanden, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands ..... 163

Gas Diffusion Barriers on Polymers Using Al₂O₃ Atomic Layer Deposition [32]
M.D. Groner and S.M. George, Dept. of Chemistry and Biochemistry, University of Colorado, Boulder,
CO; and R.S McLean and P.F Carcia, DuPont Central Research & Development, Wilmington, DE ..... 169

Advanced CVD Silicon Carbide Barrier Technology for Protection from Detrimental Gases [33]
L. Zambov, K. Weidner, V. Shamamian, R. Camilletti, U. Pernisz, S. Snow, and M. Loboda, Dow Corning Co., Midland, MI; and D. Gidley, H-G. Peng, and R. Vallery, University of Michigan, Ann Arbor, MI ..... 173

Sputter Deposited Titanium Oxide Coatings for Plasma Display Filters [34]
P. Persoone, Bekaert Technology Center, Zwevegem, Belgium; and S. Dierickx, S. Luys, and W. De Bosscher, Bekaert Advanced Coatings, Zulte, Belgium ..... 180

Automatic Permeability Testing: The Challenges and Solutions [35]
A. Hartvigsen, PBI-Dansensor A/S, Ringsted, Denmark ..... 184

Water Vapor Permeation Testing of Ultra-Barriers: Limitations of Current Methods and Advancements Resulting in Increased Sensitivity [36]
M. Stevens, S. Tuomela, and D. Mayer, MOCON, Inc., Minneapolis, MN ..... 189

Ion-induced Effects During Reactive Sputtering of ITO Films [37]
M. Dudek, O. Zabeida, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique deMontréal, Québec, Canada ..... 192

Joint Session: Plasma Processing of Webs

Continuous Deposition of Diamond-Like Films on Moving Substrates [38]
M.M. David, D.G. O'Neill, D.J. McClure, B.J. Gates, C.B. Shay, M.C. Gifford, J.D. Heininger, and S.P. Maki, 3M Company, St. Paul, MN ..... 199

Non Thermal Atmospheric Pressure Jet for Surface Modification [39]
K.-D. Weltmann, J. Ehlbeck, R. Foest, and M. Stieber, Institute for Low-Temperature Plasma Physics (INP), Greifswald, Germany ..... 208

Deposition of Functional Coatings Using an In-line Atmospheric Pressure Plasma Apparatus [40]
D.P. Dowling, B. Twomey, and G. Byrne, Surface Engineering Group, AMS, Mechanical Engineering, Dublin, Ireland; and L. O'Neill and L.-A. O'Hare, Dow Corning Plasma Solutions,Cork, Ireland ..... 214

An Atmospheric Pressure Plasma Route to Hydrophilic Coatings [41]
L. O'Neill, S.P. Ryan, L-A. O'Hare, S.R. Leadley, and A.J. Goodwin, Dow Corning Plasma Solutions, Cork, Ireland ..... 219

Uniform Glow-Like Atmospheric DBD for Surface Treatment and Deposition [42]
P. Peeters, E. Aldea, and M.C.M van de Sanden, Eindhoven University of Technology, Department of Applied Physics, The Netherlands; and H. de Vries, Fuji Photo Film, Tilburg, The Netherlands ..... 224

In Chamber Pre-treatment for Vacuum Web Coaters [43]
R. Ludwig, R. Kukla, H.J. Lotz, G. Hoffmann, G. Steiniger, and P. Sauer, Applied Films GmbH & Co KG, Alzenau, Germany; and L. Josephson, Applied Films Corporation, Longmont, CO ..... 229

Plasma Pre-treatment of Polymer Webs for Vacuum Deposition [44]
W.C. Kittler, Jr., Gnomic Group LLC, Rohnert Park, CA; P. Diffendaffer, Venture Technology, Inc., Santa Rosa, CA ..... 233

Effect of Anti-blocking Particles on Oxygen Transmission Rate of SiOx Barrier Coatings Deposited by PECVD on PET Films [45]
P. Fayet and B. Jaccoud, Tetra Pak R&D, Plasma Technology, Romont, Switzerland; and R. Davis and D. Klein, Mitsubishi Polyester Film GmbH, Wiesbaden, Germany ..... 237

Plasma Processing of Polyester Webs in Capacitively Coupled Low-Radio-Frequency Discharges [46]
J.M. Grace, L.J. Gerenser, H.K. Zhuang, D.R. Freeman, M.J. Heinsler, Eastman Kodak Company, Rochester, NY ..... 241

Large Area Coating

Theoretical Considerations of Magnetron Discharges with Respect to Arcing and Plasma Structure in DC and AC Sputtering [47]
T. Oyama, E. Shidoji, and T. Mashimo, Asahi Glass Company Ltd., Yokohama, Japan ..... 249

Monte Carlo Simulation of Anomalous Erosion in Large Area Sputter Magnetrons [48]
G. Buyle, D. Depla, K. Eufinger, and R. De Gryse, Ghent University, Ghent, Belgium; and W. De Bosscher, Bekaert Advanced Coatings N.V., Zulte, Belgium ..... 254

Flexibility and Productivity Improvements in a New Coating System Design [49]
P. Greene, S. Nadel, and P. Ceelen, VACUUM COATING Technologies, Fairfield, CA ..... 260

Advanced Rotatable Magnetron Module Designed for Large Area Glass Coaters [50]
J. Brückner, G. Teschner, F. Milde, and J. Krause, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany ..... 265

Advances in Sputter Hardware for Rotating Cylindrical Magnetron Sputtering [51]
K. Dellaert, J. De Boever, S. Porteman, and W. De Bosscher, Bekaert Advanced Coatings, Zulte, Belgium ..... 270

Large Area Rotating Cylindrical Magnetron Sputtering: Magnet System Enhancements [52]
A. Blondeel and R. Van Nuffel, Bekaert Advanced Coatings N.V., Deinze, Belgium; W. De Bosscher, K. Dellaert, and R. Broché, Bekaert Advanced Coatings N.V., Zulte, Belgium; and N. Fourneau, Bekaert Technology Center, Zwevegem, Belgium ..... 275

MF and RF Systems for Large Area Glass Coating and Flat Panel Display Applications [53]
T. Rettich, M. Blattner, and P. Wiedemuth, HÜTTINGER Elektronik GmbH + Co. KG, Freiburg, Germany ..... 280

New Steps towards Large Area Plasma Activated EB-PVD [54]
E. Reinhold and C. Steuer, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany; and C. Metzner and B. Scheffel, Fraunhofer Institut Elektronenstrahl- und Plasmatechnik, Dresden, Germany  ..... 285

Aspects of the Target Voltage Behavior in Reactive Sputtering [55]
R. De Gryse, D. Depla, and J. Haemers, Ghent University, Ghent, Belgium ..... 290

Modeling of the Plasma Impedance in Reactive Magnetron Sputtering for Various Target Materials [56]
A. Pflug, M. Siemers, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany; and O. Kappertz, T. Nyberg, and S. Berg, Ångstrom Laboratory, Uppsala University, Uppsala, Sweden; and D. Severin and M. Wuttig, I. Physikalisches Institut (1A), Aachen, Germany ..... 298

Hydrogen Doping of ZnO:Al Films Deposited by Pulsed DC-Sputtering of Ceramic Targets [57]
F. Ruske, V. Sittinger, W. Werner, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany; and K.-U. van Osten, K. Dietrich, and R. Rix, GfE Metalle und Materialien GmbH, Nürnberg, Germany ..... 302

New Developments in the Manufacturing of Thermal Sprayed Cylindrical Targets [58]
H. Delrue, J. Van Holsbeke, A. Blondeel, and W. De Bosscher, Bekaert Advanced Coatings N.V., Deinze, Belgium ..... 308

Pulsed Plasmas for Reactive Deposition of ITO Layers [59]
W.-M. Gnehr, U. Hartung, T. Kopte, Fraunhofer Institut für Elektronenstrahl- und Plasmatechnik (FEP), Dresden, Germany ..... 312

Production of Rotatable Sputter Targets for Large Area Coating Using Hot Isostatic Pressing (HIP) [60]
A. Plaisted, Soleras Ltd., Biddeford, ME; and J. Runkle, UltraClad Corporation, Andover, MA ..... 317

Flowform Rotatable Sputtering Targets [61]
M. Fonte, Dynamic Flowform, Billerica, MA ..... 320

Modelling of Sputter Erosion Rate Enhancement from Ceramic Targets [62]
T. Nyberg, O. Kappertz, D. Rosen, and T. Kubart, The Ångström Laboratory, Uppsala University, Uppsala, Sweden; D. Severin, Physikalisches Institut IA, Aachen, Germany; A. Pflug, Fraunhofer-Institute for Thin Films and Surface Engineering (IST), Braunschweig, Germany; and S. Berg, The Ångström Laboratory, Uppsala University, Uppsala, Sweden ..... 324

Latest Progress of Coating Technology in Architectural Glass Coaters and Applications [63]
M. Geisler, J. Bruch, A. Kastner, A. Reus, R. Trassl, A. Sauer, and M. Liehr, Applied Films GmbH & Co, Alzenau, Germany; and R. Newcomb, Applied Films Corporation, Longmont, CO ..... 329

Optical Coating

Recent Advances in Optical Characterization of Thin Films by Spectroscopic Ellipsometry [64]
D.E. Aspnes, Physics Dept., North Carolina State University, Raleigh, NC ..... 337

A New Figure of Merit for Solar Selective Surfaces [65]
B.W. Woods, D.W. Thompson, and J.A. Woollam, Department of Electrical Engineering, University of Nebraska, Lincoln, NE ..... 341

Coherent Modeling and Measurement of Anisotropic Multilayer Stack using Conventional Ellipsometry Applications [66]
H. Touir, M. Stchakovsky, and R. Ossikovski, Horiba Jobin Yvon, Chilly-Mazarin, France; M. Warenghem, Universite d'Artois, Lens Cedex, France; and A. Kramer, Horiba Jobin Yvon, Edison, NJ ..... 345

Reverse Engineering as an Approach to Statistical Process Analysis [67]
J. Kruschwitz, JK Consulting, Rochester, NY; and I. Stevenson and G. Sadkhin, Denton Vacuum, LLC, Moorestown, NJ ..... 350

Dealing with Sensitivity Variations During the Manufacture of Optical Coatings [68]
D. Poitras, Institute for Microstructural Sciences, National Research Council of Canada, Ottawa, Canada ..... 354

High Performance Wear Resistant Coatings on Plastics [69]
S. Bauer, U. Weber, U. Rothhaar, G. Roemer-Scheuermann, M. Kuhr, M. Fiedler, and M. Lohmeyer, SCHOTT AG, Mainz, Germany ..... 359

End-Hall Ion Source Characterization at High Power [70]
D. Burtner, V. Zhurin, and D. Siegfried, Veeco Instruments, Inc., Fort Collins, CO ..... 365

Super Smooth Metal Oxide Thin Films Using Closed Field Reactive Magnetron Sputtering [71]
J.M. Walls, I.T. Brinkley, D.R. Gibson, and E.M. Waddell, Applied Multilayers Ltd., Leicestershire, United Kingdom ..... 370

Rapid Optical Immunoassays (OIA) to Detect Environmental Agents and Pathogens in Clinical Specimens [72]
J. Jones-Meehan, A. Churilla, S. Francesconi, and B. Oyofo, Naval Research Laboratory, Washington, D.C.; and D. Yost, ThermoElectron Inc., Louisville, CO ..... 375

Playing with Light - The Quest for New Optically Variable Devices [73]
B. Baloukas*, S. Larouche, and L. Martinu, Engineering Physics Department, École Polytechnique, Montréal, Canada     381

Fabrication and Analysis of Coatings in EUV Range [74]
C.-C. Lee, P.-H. Lin, J.-Y. Wu, and J.-C. Hsu, Thin Film Technology Center/Institute of Optical Science, National Central University, Chung Li, Taiwan ..... 387

Non-Polarizing Beamsplitter and AR Coating Design [75]
R.R. Willey, Willey Optical, Consultants, Charlevoix, MI ..... 391

Electrochemical Impedance Spectroscopy Studies of Protected Silver Reflectors Deposited by Magnetron Sputtering [76]
F. Sabary, V. Griveau, C. Marcel, and D. Marteau, Commissariat à l'Energie Atomique, Centre du Ripault, Monts, France ..... 396

Improving Rate Control in Electron-Beam Evaporated Optical Coatings: Maintaining Source Surface Uniformity for Large Size Laser Optics Coatings and Evaluation of System Drift [77]
B. Xu and M. Gevelber, Manufacturing Engineering, Boston University, Brookline, MA; D. Smith, Plymouth Grating Laboratory Inc., Plymouth, MA; and B. Vattiat, Cyber Materials LLC, Auburndale, MA ..... 400

Accurate Control of Thin Film Thickness Profile using a Multi-Aperture Mask [78]
J. Arkwright, CSIRO Industrial Physics, Lindfield, Australia ..... 406

Influence of Low Ion Bombardment Energy on Interface Formation and Thin Film Growth in a Plasma-CVD Environment [79]
A. Amassian, P. Desjardins, and L. Martinu, École Polytechnique, Montréal, Canada ..... 410

Plasmon Resonance Spectroscopy as a Biosensor for Investigating Lipid Membranes [80]
Z. Salamon and G. Tollin, Department of Biochemistry and Molecular Biophysics, University of Arizona, Tucson, AZ; and I. Stevenson, Denton Vacuum, LLC, Moorestown, NJ ..... 417

Reducing the Stress of Hafnia/Silica Multilayers With Ion-Assisted Deposition for Use in High-Power Diffraction Gratings [81]
D.J. Smith, C.M. Smith, D. Hillier, and S.D. Smith, Plymouth Grating Laboratory, Inc., Plymouth, MA ..... 421

Plasma Processing

Introduction to the Drug Discovery Industry: Polymers and Plasmas [82]
P. Gagnon, D.S. Hoover, A.J. Tanner, J. Ryan, M.D. Bryhan, O.V. Lachance, and K.A. Titus, Corning, Inc., Kennebunk, ME ..... 429

Deposition of Silicon Dioxide Films Using Electron Beam-Generated Plasmas [83]
S.G. Walton and D. Leonhardt, US Naval Research Laboratory, Washington, DC ..... 433

Deposition of Silicon Oxide Films onto 3D Geometries by Plasma Enhanced CVD [84]
A. Bieder, A. Sonnenfeld, B. Borer, and Ph. Rudolf von Rohr, Swiss Federal Institute of Technology (ETH) Zurich, Zurich, Switzerland  ..... 438

Effects of Diamond Growth with Increasing Pressure on Larger Deposition Area [85]
H. Sung-Spitzl and R. Spitzl, iplas innovative plasma systems GmbH, Troisdorf, Germany ..... 444

Low-Energy End-Hall Ion Source Characterization at Millitorr Pressures [86]
J.R. Kahn, H.R. Kaufman, and R.E. Nethery, Kaufman & Robinson, Inc., Fort Collins, CO; R.S. Robinson, Colorado State University, Fort Collins, CO; and C.M. Shonka, Kaufman & Robinson, Inc., Fort Collins, CO ..... 445

Combination of Hollow Cathode and Vacuum Arc Plasma for Effective Hard Material Coatings on Tools [87]
M. Holzherr, M. Falz, and R. Wilberg, VTD VAKUUMTECHNIK DRESDEN GmbH, Dresden, Germany ..... 452

High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review [88]
U. Helmersson, M. Lattemann, J. Alami, and J. Bohlmark, Linköping University, Linköping, Sweden; A.P. Ehiasarian, Sheffield Hallam University, Sheffield, UK; and J.T. Gudmundsson, University of Iceland, Reykjavík, Iceland ..... 458

Characterization of High-power Pulsed dc Magnetron Discharges for Ionized High-rate Sputtering of Copper Films [89]
J. Vlcek, A.D. Pajdarova, P. Belsky, J. Lukas, P. Kudlacek, and J. Musil, Department of Physics, University of West Bohemia, Plzen, Czech Republic ..... 465

The Ion Energy Distributions in a High Power Impulse Magnetron Plasma [90]
J. Bohlmark*, Linköping University, Linköping, Sweden; A.P. Ehiasarian, Sheffield Hallam University, Sheffield, United Kingdom; and M. Lattemann, J. Alami, and U. Helmersson, Linköping University, Linköping, Sweden ..... 470

HIPIMS Deposition of Copper Films: Correlation of Experiments to Model Predictions [91]
S. Chennadi, Department of Mechanical Engineering, University of Nebraska, Lincoln, NE; D.J. Christie, Advanced Energy, Fort Collins, CO; and S. Sevvana, R.K. Lakkaraju, J. Li, D.M. Mihut, and S.L. Rohde, Department of Mechanical Engineering, University of Nebraska, Lincoln, NE ..... 474

High Power Impulse Magnetron Sputtering (HIPIMS) Pre-treatment for the Deposition of Hard Coatings [92]
A.P. Ehiasarian and P.Eh. Hovsepian, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield, United Kingdom; and M. Lattemann, J. Böhlmark, and U. Helmersson, IFM, Linköping University, Linköping, Sweden ..... 480

Estimation of the Electron Temperature and Density from Space and Time-resolved O.E.S. During Pulsed DC Operation of an Opposed Target Magnetron [93]
T. Moiseev, National Centre for Plasma Science and Technology, Dublin City University, Dublin, Ireland; and D.C. Cameron, ASTRaL, Lappeeranta Univ. of Tech., Mikkeli, Finland ..... 485

Time-resolved Double Probe Measurements in a Pulsed Magnetron Discharge [94]
S. Karkari, School of Physical Sciences, DCU, Dublin, Ireland; and J.W. Bradley, Dept. of Electrical Engineering and Electronics, University of Liverpool, Liverpool, United Kingdom ..... 491

Pulsed Magnetron Sputtering of Powder Targets: A New Development Tool for Multi-component Coatings [95]
P.J. Kelly, Surface Engineering Group, Manchester Metropolitan University, Manchester, United Kingdom; Y. Zhou and J. Hisek, Institute for Materials Research, University of Salford, Salford, United Kingdom; M. Audronis, University of Sheffield, Sheffield, United Kingdom; and E. Mensur Alkoy, Dept. of Physics, Kocaeli University, Kocaeli, Turkey ..... 495

Model Prediction and Empirical Confirmation of Rate Scaling with Peak Power for High Power Pulse Magnetron Sputtering (HPPMS) Deposition of Thin Ag Films [96]
D.J. Christie, Advanced Energy, Fort Collins, CO; A. Pflug, V. Sittinger, F. Ruske, M. Siemers, and B. Szyszka, Fraunhofer-Institute for Thin Films and Surface Engineering (IST), Braunschweig, Germany; and M. Geisler, Applied Films GmbH & Co.KG, Alzenau, Germany ..... 501

Time and Spatially Resolved Studies of an kHz-excited Atmospheric Pressure Plasma Jet for Industrial Applications [97]
M. Teschke, JE PlasmaConsult GmbH, Wuppertal, Germany, and University of Wuppertal, Microstructure Research Centre Wuppertal, Germany; J. Kedzierski, University of Wuppertal, Microstructure Research Centre Wuppertal, Germany; and J. Engemann, JE PlasmaConsult GmbH, Wuppertal, Germany, and University of Wuppertal, Microstructure Research Centre Wuppertal, Germany ..... 504

Improving Magnetron Sputtered Ta Coatings for Gun Bore Applications [98]
S.L. Lee, J. Mueller, L. Collins, M. Cipollo, C. Mulligan, and G. Vigilante, US Army Armament Research, Development and Engineering Center, Benét Laboratories, Watervliet, NY ..... 511

Pulsed DC Sputtering to Improve Adhesion in Cylindrical Magnetron Sputtered Tantalum Coatings on Gun Steel [99]
M. Cipollo, S.L. Lee, C. Mulligan, and M. Wotzak, US Army Armament Research Development and Engineering Center, Benét Laboratories, Watervliet, NY ..... 519

Magnetic Field Structure During Sputter Deposition Processes Involving Ferromagnetic Target Media [100]
M. Devine and C. Li, Dexter Magnetic Technologies, Inc., Hicksville, NY ..... 524

Process Diagnostics of Inductively Coupled Plasma Magnetron Sputtering of Mg in Ar + O₂ [101]
J. Joo, W. Yang, and T. Kim, Department of Materials Science and Engineering, Kunsan National University, Kunsan, Korea ..... 528

Real-Time Growth Studies on the Expanding Thermal Plasma Deposited ZnO Films by Means of In Situ Spectroscopic Ellipsometry [102]
I.Volintiru and M. Creatore, Eindhoven University of Technology, Department of Applied Physics, Eindhoven, The Netherlands; J.L. Linden, TNO Science and Industry, Eindhoven, The Netherlands; and M.C.M. van de Sanden, Eindhoven University of Technology, Department of Applied Physics, Eindhoven, The Netherlands ..... 534

Plasma Treatment of Polyethylene Powder - Process and Application [103]
P. Spatenka, J. Hladik, A. Kolouch, A. Pfitzmann, and P. Knoth, Technical University of Liberec, Department of Material Science, Liberec, Czech Republic ..... 540

Tribological and Decorative Coating

Nanostructured Ti-B-C-N Thin Films Produced from Composite Targets Using Unbalanced Magnetron Sputtering [104]
D. Zhong, I-W. Park, A.O. Kunrath, and B. Mishra, Advanced Coatings & Surface Engineering Laboratory, Colorado School of Mines, Golden, CO; K.H. Kim, School of Materials Science and Engineering, Pusan National University, Busan, South Korea; A.A. Voevodin, Air Force Research Laboratory, MLBT, Materials Directorate, Wright Patterson Air Force Base, OH; E.A. Levashov, Center for SHS, Moscow State Institute for Steels and Alloys, Moscow, Russia; and J.J. Moore, Advanced Coatings & Surface Engineering Laboratory, Colorado School of Mines, Golden, CO ..... 547

Comparison Between WCC/DLC, CrN/DLC and RF Produced DLC Coatings [105]
A. Hieke, T. Hurkmans, and G.J. van der Kolk, IonBond Netherlands B.V., Venlo, The Netherlands; and M. Tobler and R. Bonetti, IonBond Switzerland, Olten, Switzerland ..... 556

Effects of Upscaling a DLC Process with the Help of a New Coater [106]
M. Esselbach, M. Grischke, and A. Ravagni, Balzers AG, Balzers, Principality of Lichtenstein ..... 562

Science and Application of Duplex Coatings [107]
J.-D. Kamminga, R. Hoy, and P. van Essen, Netherlands Institute for Metals Research, Delft, The Netherlands; D. Doerwald and M. Schreurs, Hauzer Techno Coating, Venlo, The Netherlands; and G.C.A.M. Janssen, Delft University of Technology, Delft, The Netherlands ..... 566

Current Progress in Large Scale Manufacturing of PVD Coatings for Decorative Applications [108]
M. Eerden, R. Tietema, and T. Krug, Hauzer Techno Coating, Venlo, The Netherlands; and P. Eh. Hovsepian, Sheffield Hallam University, Sheffield, United Kingdom ..... 575

Structural and Optical Characterization of Decorative ZrOxNy Thin Films [109]
P. Carvalho*, F. Vaz, L. Cunha, L. Rebouta, C.J. Tavares, and C. Moura, Universidade do Minho, Guimarães, Portugal; E. Alves, ITN, Departamento de Física, Sacavém, Portugal; A. Cavaleiro, ICMES - Fac. Ciências Tecnologia Universidade de Coimbra, Coimbra, Portugal; and Ph. Godeau, E. Le Bourhis, and J.P. Riviere, Laboratoire de Métallurgie Physique, Université de Poitiers, Futuroscope, France ..... 580

Comparison of TiCN Coatings by Arc Evaporation and Unbalanced Magnetron Sputtering [110]
M. Eerden, J. Landsbergen, R. Tietema, and T. Krug, Hauzer Techno Coating, Venlo, The Netherlands ..... 584

Decorative Electric Arc PVD Coatings [111]
J.A. García, R. Martínez. M. Rico, R. Bueno, G.G. Fuentes, and R.J. Rodríguez, Asociación de la Industria Navarra, Pamplona, Spain ..... 588

Measurement of Super Hard Coatings by Instrumented Nano-indentation: Progress Report on the International VAMAS Activity (TWA22) [112]
J.E. Klemberg-Sapieha, L. Martinu, and P. Jedrzejowski, École Polytechnique, Montreal, Quebec, Canada; and N. Jennett, National Physical Laboratory, Teddington, Middlesex, United Kingdom ..... 592

Providing Oil-out Protection to Rolling Element Bearings with Coatings [113]
G.L. Doll, R.D. Evans, and S.P. Johnson, The Timken Company, Canton, OH ..... 595

Influence of Substrate Position on Tribological Properties of Titanium Carbide Films [114]
J.M. Anton and B. Mishra, Colorado School of Mines, Golden, CO; and F.M. Kustas, Engineered Coatings, Inc., Parker, CO ..... 599

Optimization of Multilayer Wear-resistant Thin Films Using Finite Element Analysis [115]
R.K. Lakkaraju, Department of Mechanical Engineering, University of Nebraska, Lincoln, NE; F. Bobaru, Department of Engineering Mechanics, University of Nebraska, Lincoln, NE; and S.L. Rohde, Department of Mechanical Engineering, University of Nebraska, Lincoln, NE ..... 604

Decorative Ni and Cr-based PVD Coatings Deposited at Room Temperature [116]
V. Teixeira, N. Lima, J.O. Carneiro, A. Portinha, and H. Fonseca, University of Minho, Physics Department, GRF Group, Guimarães, Portugal ..... 610

Vacuum Web Coating

Multiprocess Roll-to-Roll Web Coater, First Results [117]
R. Kukla, H.G. Lotz, R. Ludwig, P. Sauer, Applied Films GmbH & Co KG, Alzenau, Germany ..... 617

Plasma Enhanced CVD Process Using a Dual Magnetron as Plasma Source [118]
C. Charton, M. Fahland, and N. Schiller, Fraunhofer Institut Electron Beam and Plasmatechnology (FEP), Dresden, Germany ..... 623

An Investigation of the Limitations of the Heat Transfer Mechanism When Using a Gas Wedge Between the Web and Drum [119]
C.A. Bishop, C.A. Bishop Consulting Ltd., Loughborough, United Kingdom; and M.J. McCann, McCann Science, Chadds Ford, PA ..... 626

Outgassing and Permeation Studies of Polymer Substrates for Barrier Films [120]
H. Nörenberg, Technolox Ltd., Oxford, United Kingdom ..... 631

New Development of "Heat Sterilization Durable SiOx Vacuum Coated Film" [121]
T. Hachisuka, S. Yoshida, and C. Okawara, Mitsubishi Plastics, Inc., Ushiku, Japan ..... 634

The Influence of the Polyester Substrate on the Structure and Performance of Vacuum-deposited Coatings [122]
D. Howells*, B.M. Henry, and H.E. Assender, University of Oxford, Oxford, United Kingdom; and L. Médico, Y. Leterrier, and J.-A.E. Månson, École Polytechnique Fédérale de Lausanne, Lausanne, Switzerland ..... 638

Permeation Barrier Studies of Multilayer Films [123]
B.M. Henry, J. Topping, H.E. Assender, and C.R.M. Grovenor, Department of Materials, University of Oxford, Oxford, United Kingdom; and L. Marras, Department of Materials Engineering and Applied Chemistry, University of Trieste, Trieste, Italy ..... 644

Cu on Polyimide Films by Vacuum Web Sputtering System for Tape Carrier Package [124]
J. Cho and Y.S. Kim, Toraysaehan Inc., Seoul, Korea; and J.-Y. Park and W.-K. Choi, Thin Film Technology Research Center, Korea Institute of Science and Technology, Seoul, Korea ..... 649

Durability and Cost Analysis of Solar Reflective Hardcoat Materials Deposited by IBAD [125]
C.E. Kennedy, National Renewable Energy Laboratory (NREL), Golden, CO; R.V. Smilgys, Science Applications International Corporation (SAIC), McLean, VA; and R.L. Swisher, Swisher and Associates, Northfield, MN ..... 653

Water Vapor Permeation Studies of Metal Oxide/Polymer Coated Plastic Films [126]
Y. Numata, T. Oya, M. Kuwahara, and K. Ito, Toyobo Co., Ltd., Otsu, Japan ..... 660

Coating Textiles in Vacuum: Extending Vacuum Web Coating Technology to Everyday Apparel [127]
M.G. Mikhael and A. Yializis, Sigma Technologies International Inc., Tucson, AZ ..... 663

Smart Materials Symposium     Extended Abstracts Only

Large Area Plastic Solar Cell Modules [128]
F.C. Krebs, H. Spanggaard, T. Kjær, M. Biancardo, and J. Alstrup, Risoe National Laboratory, Roskilde, Denmark ..... 669

Oxygen Generation and Biocompatibility Aspects of a Photolytic Artificial Lung Device [129]
P.M. Martin, Pacific Northwest National Laboratory, Richland, WA; T.A. Snyder and M.V. Kameneva, University of Pittsburgh, Pittsburgh, PA; B. Monzyk and E.C. Burckle, Battelle Memorial Institute, Columbus, OH; A. Vollmer, T.A. Thorsen, and R.J. Gilbert, Massachusetts Institute of Technology, Cambridge, MA; K.A. Dasse, Pharos LLC, Waltham, MA; and H.S. Borovetz and W.R. Wagner, University of Pittsburgh, Pittsburgh, PA ..... 670

Reactive Sputtering Deposition of Photocatalytic TiO₂ Thin Films on Glass Substrates [130]
C.J. Tavares, J. Vieira, L. Rebouta, G. Hungerford, and P. Coutinho, Departamento de Física, Universidade do Minho, Guimarães, Portugal    673

Advances in Smart Materials Technologies-Windows [131]
C.M. Lampert, Star Science, Cotati, CA ..... 675

Characterization of Oxygen in Oxide Materials Using 18O² Gas: Photocatalytic Properties of TiO₂ and Electrical Properties of SnO₂ Films [132]
S. Takeda, Asahi Glass Co., Ltd., Yokohama, Japan ..... 678

Electrochromics Technology for Smart Window Applications [133]
N.L. Sbar and H.E. Sanders, SAGE Electrochromics, Inc., Faribault, MN ..... 679

Electrochromic Materials and Devices: Tungsten Oxide, Nickel Oxide, and Foils Based on These [134]
E. Avendaño, A. Azens, L. Berggren, G.A. Niklasson, and C.G. Granqvist, Department of Engineering Sciences, The Ångström Laboratory, Uppsala University, Uppsala, Sweden ..... 681

Electrochromic Devices Based on Wide Band-Gap Nanocrystalline Semiconductors Functionalized with Polynuclear Mixed Valence Compounds [135]
M. Biancardo, Risø National Laboratory, Roskilde, Denmark; and C.A. Bignozzi, University of Ferrara, Chemistry Department, Ferrara, Italy ..... 682

Characterization of the Thermal Insulating Properties of Vacuum Glazing [136]
N. Ng, R.E. Collins, and L. So, The University of Sydney, Sydney, Australia ..... 684

Analysis of the Internal Glass Surfaces of Vacuum Glazing [137]
L. So and N. Ng, The University of Sydney, Sydney, Australia ..... 686

Iron-doped Photocatalytic TiO2 Sputtered Coatings on Plastics for Self-cleaning Applications [138]
J.O. Carneiro, V. Teixeira, A. Portinha, A. Magalhães, R. Newton, University of Minho, Physics Department, GRF Group, Guimarães, Portugal; and P. Coutinho, University of Minho, Physics Department, FAMO Group, Braga, Portugal ..... 688

ZnO:Al Films for a-Si:H Thin Film Solar Cells [139]
B. Szyszka, V. Sittinger, F. Ruske, W. Werner, and A. Pflug, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany; and B. Rech, Institute of Photovoltaics IPV, Jülich, Germany ..... 691

Poster Session

Robust System Identification and Optimized Tuning for Control of Evaporation Processes [140]
G. Reimann, M. Gevelber, and B. Vattiat, Cyber Materials LLC, Auburndale, MA; and J. Hildebrand and C. Hildebrand, Maxtek Inc., Santa Fe Springs, CA ..... 697

Structure and Secondary Electron Emission Properties of MgO Films Deposited by Pulsed Mid-Frequency Magnetron Sputtering [141]
C. Peters and U. Krause, Fraunhofer Institute FEP, Dresden, Germany; and H. Kupfer, R. Kleinhempel, and F. Richter, University of Technology Chemnitz, Institute of Physics, Chemnitz, Germany ..... 703

A Technique for Measuring the Film Thickness of Ultrathin Metallic Thin Films, 4-20 nm, Using Atomic Force Microscopy [142]
G. Acosta*, D.D. Allred, and R.C. Davis, Brigham Young University, Provo, UT ..... 707

Characterization of High Quality Indium-Tin Oxide Films Deposited Over a Range of Processing Conditions [143]
R. Thunuguntla, E. Ada, and S. Guptaa, The University of Alabama, Tuscaloosa, AL ..... 714

Rate Enhancement in High Power Pulsed Magnetron Sputtering Growth using Secondary Discharge Confinement [144]
S. Sevvana, S. Chennadi, R.K. Lakkaraju, J. Li, D.M. Mihut, and S.L. Rohde, Department of Mechanical Engineering, University of Nebraska, Lincoln, NE ..... 720

Montmorillonite Nanocomposites for Clear Coatings [145]
P.A. Mahanwar and L.K. Chaudhari, Paint Technology and Polymer Engineering and Technology Division, U.I.C.T., Maharashtra, India ..... 726

High Performance Plasma Deposition Source (PDS) [146]
A. Colautti, F. Moreni, and W. Berra, Satisloh, Settimo Milanese, Italy; A. Brierley, Satisloh, United Kingdom; and T. Deodato, Satisloh, Italy; T. Glomb, Satisloh, Switzerland; and D. Porta, L. Rossi, A. Vannucci, and G. Viscomi, Satisloh, Settimo Milanese, Italy ..... 731

High Power Pulsed Magnetron Sputtered Ti Films [147]
H.Y. Lee, Y.M. Kim, and J.G. Han, Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University, Suwon, Korea ..... 734

A Study of Interfacial Layer Effect Synthesized by High Energy Ion Cascade on Adhesion Strength Deterioration Between Copper Thin Film and Polyimide Substrates [148]
Y.M. Chung, W.S. Jung, C.S. Moon, and J.G. Han, Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University, Korea ..... 739

  *SVC Student Presenter
Note: Number in brackets on the top line is the paper number for 2005. *SVC Student Presenter