1993 36th Technical Conference Proceedings

Note: Number in brackets on the top line is the paper number for 1993.

Plenary Session

Stealth Design of the F-117A [1]
A.C. Brown, Lockheed Aeronautical Systems Company (retired).....3

Plasma Modification of Polymer Surfaces [2]
F.D.Egitto and L.J. Matienzo, IBM Corporation.....10

Reflective Coatings for Solar Applications [3]
G. Jorgensen, National Renewable Energy Laboratory.....23

Special Lunch-time Lecture

Big Foot-Little Foot: One is a Mystery; the Other Doesn't have to Be! [4]
C.J. Hamel, IBM Technology Products.....32

Optical Coating

Real-Time Monitoring of Optical Properties and Stress in Thin Films [5]
R.P. Netterfield, P.J. Martin and T.J. Kinder, CSIRO, Australia.....41

Optical Losses of Fluoride Coatings for UV/VUV Applications Deposited by Reactive IAD and IBS Processes [6]
J. Kolbe, H. Schink and D. Ristau, Institut für Quantenoptik, Universität Hannover , Germany.....44

Plasma Polymerization: A New Technology for Functional Coatings on Plas tics [7]
R. Hora and C. Wohlrab, Balzers AG, Principality of Liechtenstein.....51

Reactive Sputtering Deposition and PE-CVD for Ophthalmic Applications [8]
C. Misiano, E. Simonetti, P. Laganà, S. Menichella, G. Parone and G. Taglioni, Centro Technologie del Vuoto, Italy.....57

Optical Constants of Evaporated and Sputtered Transparent Conductive Oxides [9]
C. Bright, Southwall Technologies, Inc......63

Metal Mode Reactive Sputtered Metal-Dielectric Coatings [10]
R.B. Sargent, T.H. Allen and K. Takano, Optical Coating Laboratory, Inc. .....68

Achieving Improved Optical Thin Film Control and Uniformity of Silicon Dioxide by Using Ion Assisted Deposition [11]
R.R. Willey, Opto Mechanik, Inc. .....75

Properties of TiO₂ and SiO₂ Films Prepared by Ion-Assisted Deposition Using a Gridless End-Hall Ion Source [12]
A.R. Buchel and M.G. Wohlwend, Balzers; and M.L. Fulton, Boeing Defense & Space Group .....82

Production of SiO₂ Films Over Large Substrate Area by Ion-Assisted Deposition of SiO with a Cold Cathode Source [13]
I.C. Stevenson, Denton Vacuum, Inc. .....88

Infrared Antireflection Coatings Without Thorium Fluoride [14]
F.C. Sulzbach, Texas Instruments, Inc. .....102

Optical, Mechanical, and Microstructural Properties of YF₃ Coatings Fabricated by Conventional and Ion-Assisted Deposition [15]
S. Mendes, University of Arizona; M.R. Jacobson, Optical Data Associates and University of Arizona; S.F. Feiman, EM Industries; Z. Tianji, University of Arizona; A. Ogloza, Naval Air Weapons Station and University of Arizona; and H.A. Macleod, Thin Film Center and University of Arizona .....109

Mixed Composition Infrared Optical Thin Films: Properties and Applications [16]
N.S. Gluck, H. Sankur and D. Taber, Rockwell International Science Center .....114

Real Time Measurement of Surface Contamination During Coating Process Based on Surface Plasmon Resonance [17]
R.R. Wang, Melles Griot, Inc.; M.R. Jacobson and H.A. Macleod, University of Arizona .....127

Automated Processing of Optical Coatings [18]
W. Leising, Leica, Inc......133

How to Move an Optical Coating Facility with Minimum Production Loss [19]
R.W. Schaffer, Evaporated Coatings, Inc. .....135

Ion Beam Deposited Diamond-Like Carbon Coatings: Characteristics and Commercial Applications in Optics [20]
T.J. Hughes, Optical Diamond Products; and F.M. Kimock, Diamonex, Inc. .....139

Reactive Ion Beam Sputter Deposition of Graded-Interface Optical Thin Films of Aluminum Oxynitride and Silicon Oxynitride [21]
S.J. Holmes and V.W. Biricik, Northrop Corporation.....146

Buffer Layers in Coating Design [22]
H.A. Macleod, Thin Film Center, Inc......151

Improved Repeatability in the Production of Periodic Thin Film Structures by the Use of "Steering" with Optical Monitoring [23]
R.R. Willey, Opto Mechanik, Inc. .....156

Extending the Life of Quartz Crystals for Optical Coatings [24]
A. Wajid, Leybold Inficon, Inc......163

Windows Software for Optical Thin Film Quality Control [25]
F. Goldstein, FTG Software Associates; and T. Mooney, Barr Associates .....168

Statistical Process Control Applications of Rutherford Backscatter Spectrometry of Multilayer Optical Thin Films [26]
S.P. Sapers, B.P. Hichwa and R. Close, Optical Coating Laboratory, Inc. .....172

Use of Commercial Glass Substrates for High Volume Thin Film Optical Coatings [27]
M.E. Wescott, S.P. Sapers and G. Smith, Optical Coating Laboratory, Inc......178

Vacuum Web Coating

High Rate Deposition on New High Speed Aluminium Roll Coaters [28]
A. Pasqui, F. Grazzini and A. Carletti, Galileo Vacuum Tec SpA , Italy.....185

Dynamics and Efficiency Aspects in the Evaporator Zone of Vacuum Metallizers [29]
J. Meinel, H. Grimm, W. Schwartz, W. Buschbeck and T. Gebele, Leybold AG, Germany.....191

Advanced Resistance Deposition Technology for Productive Roll Coating [30]
I. Baxter, General Vacuum Equipment, United Kingdom.....197

New High Efficiency Compact Coating Lines for the Precoating and Top Coating of Metallized Papers [31]
M. Bridges, Promatec Coating Equipment, Ltd. , United Kingdom.....206

Design Considerations of a High Efficiency Cryogenic Pumping System for Paper Metallization [32]
F. Casey, General Vacuum Equipment, United Kingdom; A.A. Broomfield, General Vacuum
Equipment; and G.H. Ellis, General Vacuum Equipment , United Kingdom.....213

Guidelines for Purchasing, Installing and Commissioning a Vacuum Web Coater [33]
D.A. Fletcher, Deposition Technologies, Inc......220

Environmental Stability of TiO_x Films [34]
P. Diffendaffer and H. Patel, Courtaulds Performance Films.....225

A New Topology for Thickness Monitoring Eddy Current Sensors [35]
J.M. Scarr and J.K. Zelisse, Delft Measurement Systems , The Netherlands.....228

A Heuristic Approach to Temperature Compensation in Non-Contact Resistance Meters for Vacuum Roll Coaters [36]
P. Duesbury, General Vacuum Equipment, United Kingdom.....232

Comparison of ITO Sputtering Process from Ceramic and Alloy Targets onto Room Temperature PET Substrates [37]
L.R. Gilbert, S.P. Maki and D.J. McClure, 3M Company .....236

Evaluation of Kapton Films for Adhesiveless Tab/Flex Circuits [38]
R.D. Weale, L.J. Matienzo, K.J. Blackwell, C. Johnson and S. Deliman, IBM Technology Products.....242

Application of Experimental Design for Roll Sputter Processing [39]
K.J. Blackwell, P.J. Cirulli and A.R. Knoll, IBM Technology Products .....248

Vacuum Coating Applications for Snack Food Packaging [40]
I.F. Gavitt, Frito-Lay, Inc. .....254

Metallizing and the Environment - The European Experience [41]
A.N. Ainscough, Van Leer Metallized Products , The Netherlands.....260

Microwaveable Metallized Barrier Coatings [42]
G.J. Walters and J. McCormick, Advanced Dielectric Technologies, Inc. .....266

Electron Beam Gun or Plasma Enhanced Chemical Vapor Deposition: The Right Choice for Transparent Barrier Coatings [43]
C. Misiano, E. Simonetti, S. Menichella, F. Staffetti and G. Taglioni, Centro Technologie del Vuoto, Italy.....269

Progress in High-Rate Electron Beam Evaporation of Oxides for Web Coating [44]
S. Schiller, M. Neumann, H. Morgner and N. Schiller, Fraunhofer-Establishment for Electron
Beam and Plasma Technology, Germany.....278

Evaporated Dielectric Colorless Films on PET and OPP Exhibiting High Barriers Toward Moisture and Oxygen [45]
R.W. Phillips, T. Markantes and C. LeGallee, Flex Products, Inc. .....293

New Developments in Transparent Barrier Coatings [46]
T. Krug, R. Ludwig and G. Steiniger, Leybold AG , Germany.....302

D.O.B.: A New Product for Transparent and Colorless Barrier Coating [47]
C. Misiano, E. Simonetti, P. Cerolini, S. Staffetti and G. Taglioni, Centro Technologie del Vuoto, Italy; A. Pasqui and F. Fusi, Galileo Vacuum Tec SpA, Italy.....307

Development of Clear Barrier Films in Europe [48]
R.S.A. Kelly, Camvac, Ltd., United Kingdom.....312

Mylar Polyester Films with Inorganic Glass Coatings [49]
G.I. Deak and S.C. Jackson, Du Pont Company..... 318

Transparent Barrier Coatings Update: Flexible Substrates [50]
J.T. Felts, Airco Coating Technology .....324

High Performance Clear Coat^TM Barrier Film [51]
M. Izu, B. Dotter, S.R. Ovshinsky, Energy Conversion Devices, Inc.; and W. Hasegawa, Hirano Tecseed Company, Ltd., Japan.....333

Advanced Processing Techniques

Negative and Positive Ions from CF₄ and CF₄/O₂ RF Discharges in Etching Silicon [52]
Y. Lin and L.J. Overzet, University of Texas at Dallas..... 343

A New High Speed Process for Vapor Depositing Acrylate Thin Films: An Update [53]
D.G. Shaw and M.C. Langlois, Catalina Coatings, Inc......348

Progress Toward Atomic Layer Epitaxy of Diamond: Diamond Films Grown One Layer at a Time [54]
R. Gat, T.I. Hukka, R.E. Rawles and M.P. D'Evelyn, Rice University .....353

Advanced Technology Flame Plasma Surface Treating System [55]
J.D. DiGiacomo, Flynn Burner Corporation ..... 356

DC-Magnetron Sputterable Silicon Carbide [56]
M. Tenhover, I. Ruppel, S.S. Lyle, The Carborundum Company ; and L.J. Pilione, Pennsylvania State University.....362

High Deposition Rate Large Area Sputtering Plant with Diode Cathodes [57]
G.A. Garzino-Demo and F.L. Lama, Braink AG , Principality of Liechtenstein.....366

Emerging Technologies

Properties of Thin Films Produced by Filtered Arc Deposition [58]
P.J. Martin, R.P. Netterfield, A. Bendavid and T.J. Kinder, CSIRO, Australia.....375

Diverse Applications of IVD Aluminum [59]
B.T. Nevill, Embee, Inc. .....379

Thin Film Media

The Effect of Hydrogen Adsorption on the Electrical Conduction in the Thin Discontinuous Palladium Films [60]
H.H. Xiao, Binghamton University .....387

Surface Inspection on Optical Disc Media [61]
C.G. Daley, Automatic Inspection Devices, Inc...... 395

A New Method of Handling Arcs and Reducing Particulates in DC Plasma Processing [62]
R.A. Scholl, Advanced Energy Industries, Inc......405

Decorative and Protective Coating

Production of PVD Decorative Hard Coatings Using Multitarget UBM Coating Machines [63]
W.-D. Münz, Hauzer Techno Coating Europe B.V. , The Netherlands.....411

PVD - Decorative Coatings on Large Three-Dimensional Parts [64]
U. Kopacz, P. Ballhause, Leybold AG, Germany; and J. Snyder, Leybold Technologies, Inc. .....419

Radiation Curable Coatings - a New Coatings Process to Consider [65]
G. Nixon, Red Spot Paint & Varnish Company, Inc......423

Maximizing the Profitability of Your Vacuum Process [66]
R. Goyins and M. Beltrano, MODOC Engineering .....427

New Deposition Equipment and Techniques to Increase Throughput [67]
M. Shannon, Red Spot Paint & Varnish Company, Inc. .....432

Hazardous Waste Liability and Insurance Issues for the Vacuum Metallizing Industry [68]
D.B.M. Ehlke and J.A. Holeman, Law Offices of Douglas B.M. Ehlke .....437

Plasma Processing

Transparent Gas Barrier Coatings Produced by Dual-Frequency PECVD [69]
J.E. Klemberg-Sapieha and L. Martinu, École Polytechnique , Canada; O.M. Küttel, University of
Fribourg, Switzerland; and M.R. Wertheimer, École Polytechnique, Canada.....445

The Novel Applications of Low Temperature ECR Enhanced Chemical Vapor Deposition [70]
J.E. Spencer and B.S. Mercer, PlasmaQuest, Inc. .....450

Deposition of Silicon Dioxide by Plasma Enhanced CVD in an Electron Cyclotron Resonance Reactor [71]
D. Webb, Texas Instruments, Inc. .....455

Recent Advances in Microwave Plasma Sources for Materials Processing [72]
R.C. Myer, Applied Science and Technology, Inc. .....461

Process Control and Instrumentation

Flash Electron Beam Evaporation: An Alternative for High and Stable Evaporation Rates in Long Run Applications [73]
R. De Gryse, Gent University, Belgium; G. Gobin, SINVACO, Belgium; H. Lievens,
Innovative Sputtering Technology, Belgium; and J. Vanderstraeten, SINVACO, Belgium.....467

Mechanical Properties of Plasma Deposited Functional Coatings Determined by Microscratch Measurements [74]
P. Leroux, École Polytechnique, Canada; A. Raveh, Nuclear Research Center Negev, Israel; J.E. Klemberg-Sapieha and L. Martinu, École Polytechnique, Canada.....472

Comparison of Electrostatic Shielded and Unshielded Inductive Coupled Plasma Sources [75]
W.L. Johnson, Prototech Research, Inc......478

Defect Quantization of Ultra Finished Surfaces by Laser Light Scatter [76]
K.P. McKinley, Censor USA, Inc......485

Large Area Rigid Coating

Utilization of Silicon Targets for Reactive Sputtering From a Rotating Cylindrical DC Magnetron Cathode [77]
J. Hillendahl and R. Newcomb, Airco Coating Technology .....491

Glass Cleaning Utilizing a Cerium Oxide Solution in a High-Volume Production Environment [78]
E.J. Wegener, Marcon Coatings, Inc. .....495

Control of Stress-Corrosion Cracking in Thin Film Designs [79]
J. Wolfe, Airco Coating Technology .....498

Control of a Reactive Sputtering Process for Large Systems [80]
W.D. Sproul, BIRL, Northwestern University .....504

Vendor Session

Post Reaction Chamber Plasma Pre-pump Scrubbing of Process Effluents [81]
R.B. DesBrisay, Process Technology Limited , Canada.....513

Applications of PlasmaQuest ECR Reactor [82]
B.S. Mercer, J. Spencer and B. Westmoreland, PlasmaQuest, Inc. .....514

Database for Coating Design [83]
H.A. Macleod and C. Clark, Thin Film Center, Inc......516

Low Cost, High Accuracy, Capacitance Pressure Transducer for Process Pressure in the Range of 0.5 to 50 Millitorr [84]
H. Gray, Edwards High Vacuum International .....517

Progress of QLF^® Barrier Coating [85]
P. Ang, Airco Coating Technology .....518