Emerging Technologies
2008 51st SVC Annual Technical Conference
April 19-24, 2008
Hyatt Regency Chicago on the River Walk, Chicago IL
Technical Program
April 19–24, 2008
Wednesday Afternoon, April 23
Emerging Technologies
Moderators: Hana Baránková, Uppsala University, Sweden and Carlo Misiano, Romana Film Sottili S.r.l., Italy
1:30 p.m. E-1 Atmospheric Pressure Plasmas for Crystalline Silicon Photovoltaics
Invited 40 min. Talk
V. Hopfe, Fraunhofer Institute for Material and Beam Technology (IWS), Thin Film Technology, Dresden, Germany; and D.W. Sheel, Salford University, Manchester, United Kingdom
2:10 p.m. E-2 Pulsed Bias PVD of Crystalline Chromia and Alumina Films at Low Temperature
M. Audronis, A. Matthews, and A. Leyland, The University of Sheffield, Sheffield, United Kingdom
2:30 p.m. E-3 Growth of Gallium Nitride Semiconductor Materials by Plasma Sputtering
D. Baldwin, 4Wave, Inc., Sterling, VA; J.P. Timler, Glacier Semiconductor, Metairie, LA; and D. Jena, University of Notre Dame, Notre Dame, IN
2:50 p.m. E-4 Deposition Rate Dependencies and Thickness Profiles from a High Density Plasma Source Sputter System
R. Chow, Z. Demir, and K. Moffitt, Lawrence Livermore National Laboratory, Livermore, CA
3:30 p.m. E-5 Preparation of Photocatalytically Active Layers on Polycarbonate by Magnetron Sputtering
T. Neubert, O. Werner, F. Neumann, and M. Vergoehl, Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig, Germany
3:50 p.m. E-6 Influence of the Annealing Temperature on the Properties of CrN/Ag and CrSiN/Ag Nano Scale Multilayers Deposited by Reactive Magnetron Sputtering
M. Baraket and D. Mercs, LERMPS/UTBM, Belfort, France; V. Demange, École des Mines, Nancy, France; and C. Coddet, LERMPS/UTBM, Belfort, France
4:10 p.m. E-7 Micro Raman and Cathodoluminescence Spectroscopy of PVD Titania Films
V. Vishnyakov, Manchester Metropolitan University, Manchester, United Kingdom; and N. Mahdjoub, Manchester Metropolitan University, Manchester, United Kingdom
4:30 p.m. E-8 Process Development and Characterization of MEMS Cantilever Structures Based on NiTi Shape Memory Thin Films
R. Savage, Cal Poly State University, San Luis Obispo, CA; D.M. Dequine, KLA-Tencor Corporation, Milpitas, CA; and D. Getchel, NEC Electronics America, Roseville, CA
4:50 p.m. E-9 Environmentally Stable Organic Light Emitting Field Effect Transistors
C. Santato, École Polytechnique de Montréal, Montréal, Canada; F. Cicoira, University of Quebec, Varennes, Canada; H. Meng, Central Research and Development, E.I. DuPont Company, Wilmington, DE; F. Rosei, University of Quebec, Varennes, Canada; and D. Perepichka, McGill University, Montréal, Canada
5:10 p.m. E-10 Molecular Assembly of Rubrene on a Metal/Metal Oxide Nanotemplate
F. Cicoira, Cornell University, Ithaca, NY; J.A. Miwa and F. Rosei, Institut National de la Recherche Scientifique (INRS), Varennes, Canada; and D.F. Perepichka, McGill University, Montréal, Canada