Optical Coating

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Tuesday Morning, April 22

Optical Coating
Moderators: Bryant Hichwa, Sonoma State University, Ric Shimshock, MLD Technologies LLC, Ulrike Schulz, Fraunhofer Institut fur Angewandte Optik und Feinmechanik (IOF), Germany, and Robert Sargent, JDSU

8:30 a.m. O-1 Advances in Precision Optical Coatings Through the Use of a Fast-Cycle Sputter Coater
Invited 40 min. Talk
R. Sargent, M. Tilsch, G. Ockenfuss, K. Hendrix, M. Grigonis, and A. Bergeron, JDSU, Santa Rosa, CA

9:10 a.m. O-2 Atomic Layer Deposition in Mass Production of Optical Coatings
S. Sneck, Beneq OY, Vantaa, Finland

9:30 a.m. O-3 Plasma Etching and Coating Techniques to Achieve Antireflection Properties in Combination with Additional Surface Functions on Plastic Optics
U. Schulz, I. Wendling, P. Munzert, and N. Kaiser, Fraunhofer Institut für Angewandte Optik und Feinmechanik (IOF), Jena, Germany

9:50 a.m. O-4 Closed Field Magnetron Sputter Deposition of Carbide and Nitrides for Optical Applications
D.R. Gibson, I. Brinkley, E.M. Waddell, and M.J. Walls, Applied Multilayers Ltd., Coalville, United Kingdom

10:30 a.m. O-5 Multilayer Optical Thin Films by Direct Deposition of High-Low Index Materials Utilizing a Closed-Drift Ion Source
J.E. Yehoda, S. Runkle, and S.J. Finke, Morgan Advanced Ceramics: Diamonex Products Division, Allentown, PA

10:50 a.m. O-6 Methods for Improving Optical Coating Quality for E-beam Deposition: Minimizing Deposition Rate Variations and Manufacturing Case Studies
G. Reimann and D. Radgowski, Cybert Materials, LLC, Boston, MA; and M. Gevelber, Boston University Brookline, MA

11:10 a.m. O-7 Reactive Magnetron Sputter Technologies for Precision Optical and Antireflective Coatings on Glass and Polymer Substrates
H. Bartzsch, P. Frach, K. Lau, and J. Weber, Fraunhofer-Institut fuer Elektronenstrahl- und Plasmatechnik (FEP), Dresden, Germany

11:30 a.m. O-8 Properties of ZrO2 Optical Thin Films Deposited by Differently Pulsed Reactive Magnetron Processes
M. Vergoehl, P. Giesel, C. Rickers, and O. Werner, Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig, Germany

11:50 a.m. O-9 Deposition of SnOx-ZnO Composite Films on Polyethylene Terephthalate Substrate Prepared by ECR-MOCVD
J.H. Park, D.J. Byun, and J.K. Lee, Korea Institute of Science and Technology, Seoul, South Korea

TBD OFT-1 Ti-B-N and Ti-B-O Scratch Resistant Weakly Conductive Transparent Coatings for Aerospace Applications
M. Ersoy and P. Hambourger, Cleveland State University, Cleveland, OH
This is a Guaranteed Optical Coating Flexible Time (OFT) presentation; it will be presented in place of a cancelled paper earlier in this session if such situation arises.

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Wednesday Morning, April 23

Optical Coating
Moderator: James Hilfiker, J.A. Woollam Co., Inc., Ludvik Martinu, École Polytechnique de Montréal, Canada, C.L. Bungay, Lockheed Martin, and W.M.M. Kessels, Eindhoven University of Technology, The Netherlands

8:30 a.m. O-10 Infrared Spectroscopic Ellipsometry for Optical Coating Development and Production
Invited 40 min. Talk
C.L. Bungay and S.R. Tuenge, Lockheed Martin, Orlando, FL

9:10 a.m. O-11 Investigating Subsurface Interfaces of Thin Film Coatings Using Annular Dark Field Scanning Transmission Electron Microscopy
G. Acosta, R. Vanfleet, D. Allred, and R.S. Turley, Brigham Young University, Provo, UT

9:30 a.m. O-12 In Situ Spectroscopic Ellipsometry for Atomic Layer Deposition
Invited 40 min. Talk
W.M.M. Kessels, Eindhoven University of Technology, Eindhoven, The Netherlands

10:30 a.m. O-13 Reflectance Standards in the Vacuum UV: Cleaning/Storage Considerations
E. Strein, Z. Strother, N.F. Brimhall, S.B. Mitchell, J. Becar, and D.D. Allred, Brigham Young University, Provo, UT

10:50 a.m. O-14 Structural Comparison of GdF₃ Films Grown on CaF₂ (111) and SiO² Substrates
J. Wang and H. Schreiber, Corning Tropel Corporation, Fairport, NY; and R.W. Davis and B.R. Wheaton, Corning, Inc., Corning, NY

11:10 a.m. O-15 Thermo-Mechanical Characteristics of Niobium Oxide Optical Thin Films Deposited by Dual Ion Beam Sputtering
E. Cetinorgu, B. Baloukas, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique de Montréal, Montréal, Canada

11:30 a.m. O-16 The Optical and Electrical Properties of AZO Films Deposited at Room Temperature
Y.H. Lin, J.C. Hsu, Y.Y. Chen, and H.L. Chen, Fu Jen Catholic University, Taiwan, R.O.C.

11:50 a.m. O-17 Luminescence Efficiency and Optical Property of CsI and NaI Films
H.L. Chen and J.C. Hsu, Fu Jen Catholic University, Taiwan, R.O.C.

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Thursday Morning, April 24

Optical Coating
Moderators: Ron Willey, Willey Optical Consultants, Norbert Kaiser, Fraunhofer Institut fur Angewandte Optik und Feinmechanik (IOF), J.J. Simon, TECSEN Laboratory, France and C. Batista, University of Portugal, Portugal

8:30 a.m. O-18 Optical Coating for Organic Solar Cells
Invited 40 min. Talk
J.J. Simon, F. Monestier, P. Torchio, D. Duche, L. Escoubas, and F. Flory, TECSEN Laboratory, Marseille, France

9:10 a.m. O-19 Intelligent Tungsten Doped VO2 Thermochromic Coatings Prepared by Reactive DC Magnetron Sputtering
C. Batista and V. Teiseira, University of Minho, Braga, Portugal

9:30 a.m. O-20 Broad Band Antireflection Coating on Zinc Sulphide Simultaneously Effective in SWIR, MWIR and LWIR Regions
A. Ghosh and A.S. Upadhyaya, IRDE, Thin Film Lab, Dehra Dun, Uttarakhand, India

9:50 a.m. O-21 New and Improved Interference Security Image Structures Based on Metamerism with Low User and Illumination Sensitivity
B. Baloukas and L. Martinu, École Polytechnique de Montréal, Montréal, Canada

10:30 a.m. O-22 Design of Non-Polarizing Beamsplitters
R.R. Willey, Willey Optical Consultants, Charlevoix, MI

10:50 a.m. O-23 Synthesis of a Variety of Optical Filters Using Rugated Index Profiles
R. Dannenberg, Eclipse Energy Systems, Inc., St. Petersburg, FL

11:10 a.m. O-24 Coatings for Short Wavelengths
N. Kaiser, T. Feigl, S. Yulin, D. Gaebler, and M. Bischoff, Fraunhofer Institute for Applied Optics and Precision Engineering (IOF), Jena, Germany

11:30 a.m. O-25 Wide-Angle, Polarizing Beam-Splitter Coating for Imaging Applications Using Sputter-Deposition Process
R. Bevis and H. Lee, Agilent Technologies, Inc., Santa Clara, CA

11:50 a.m. O-26 Design and Fabrication of Broadband Mirror for MID-IR-OPO Laser (Wavelength region 1.2-2.1 micrometer) with TiO₂ and SiO₂ Materials using Electron-Beam Evaporation Technique
D. Kumar, L. Dasgupta, and A. Kumar, DRDO, Delhi, India

Preliminary Program Index